XS

Xinghua Sun

TL Tokyo Electron Limited: 10 patents #748 of 5,567Top 15%
KC Kunshan Luxshare Rf Technology Co.: 2 patents #7 of 21Top 35%
SC Suzhou Luxshare Technology Co.: 2 patents #9 of 14Top 65%
GI Globe Union Industrial: 1 patents #100 of 176Top 60%
SC Shenzhen First Union Technology Co.: 1 patents #56 of 108Top 55%
📍 Suzhou, NY: #8 of 13 inventorsTop 65%
Overall (All Time): #282,211 of 4,157,543Top 7%
16
Patents All Time

Issued Patents All Time

Showing 1–16 of 16 patents

Patent #TitleCo-InventorsDate
12412969 Coaxial filter and communication radio frequency device Ye Wang, Wen GE 2025-09-09
12212031 Cavity filter Wen GE, Wei Wang 2025-01-28
11929537 Resonator filter Shance LYU, Ye Wang 2024-03-12
11756790 Method for patterning a dielectric layer Yen-Tien Lu, Shihsheng Chang, Eric Chih-Fang Liu, Angelique Raley, Katie Lutker-Lee 2023-09-12
11742241 ALD (atomic layer deposition) liner for via profile control and related applications Yen-Tien Lu, Angelique Raley, David L. O'Meara, Jeffrey Smith 2023-08-29
11532517 Localized etch stop layer Yun Han, Andrew Metz, David L. O'Meara, Kandabara Tapily, Henan Zhang +1 more 2022-12-20
11515203 Selective deposition of conductive cap for fully-aligned-via (FAV) Yen-Tien Lu, Kai-Hung Yu, Angelique Raley 2022-11-29
11335984 Dielectric waveguide filter Shance Lv, Shaodong LI 2022-05-17
11289325 Radiation of substrates during processing and systems thereof Michael Edley, Yen-Tien Lu, Angelique Raley, Henan Zhang, Hiroyuki Suzuki +1 more 2022-03-29
11164781 ALD (atomic layer deposition) liner for via profile control and related applications Yen-Tien Lu, Angelique Raley, David L. O'Meara, Jeffrey Smith 2021-11-02
11127594 Manufacturing methods for mandrel pull from spacers for multi-color patterning Angelique Raley, Andrew Metz 2021-09-21
11121027 High aspect ratio via etch using atomic layer deposition protection layer Yen-Tien Lu, Eric Chih-Fang Liu, Andrew Metz 2021-09-14
11031798 Charger for electronic cigarette Yonghai Li, Zhongli Xu 2021-06-08
10964587 Atomic layer deposition for low-K trench protection during etch Yen-Tien Lu, David L. O'Meara, Angelique Raley 2021-03-30
10304725 Manufacturing methods to protect ULK materials from damage during etch processing to obtain desired features Takashi Yamamura, Hiroyuki Nagai, Ryuichi Asako, Katie Lutker-Lee 2019-05-28
D573385 Bath accessory base Ying Guo, Fenyong Nan 2008-07-22