Issued Patents All Time
Showing 1–25 of 27 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12417928 | Substrate processing method and substrate processing system | Takeo Nakano, Hirokazu Ueda, Mitsuaki Iwashita, Naoki UMESHITA | 2025-09-16 |
| 12406862 | Vacuum processing apparatus and oxidizing gas removal method | Hirokazu Ueda, Yoji IIZUKA, Mitsuaki Iwashita, Antonio Luis Pacheco Rotondaro, Dipak Aryal +5 more | 2025-09-02 |
| 12379653 | Pattern formation method and photosensitive hard mask | Hajime NAKABAYASHI, Tomohito YAMAJI, Kazuki Yamada | 2025-08-05 |
| 12011738 | Substrate processing method and ionic liquid | Takeo Nakano, Hirokazu Ueda, Mitsuaki Iwashita, Naoki UMESHITA, Kenichi Uki | 2024-06-18 |
| 11842900 | Etching method and plasma processing apparatus | — | 2023-12-12 |
| 11538693 | Substrate processing method and substrate processing system | — | 2022-12-27 |
| 11488836 | Apparatus for substrate processing | Masahiro Tabata, Toru Hisamatsu, Sho Kumakura, Shinya Ishikawa, Masanobu Honda | 2022-11-01 |
| 11456184 | Substrate processing method and substrate processing system | Tatsuya Yamaguchi | 2022-09-27 |
| 10923332 | Plasma processing method | Masahiro Tabata, Takao FUNAKUBO | 2021-02-16 |
| 10903085 | Method for etching organic region | Masahiro Tabata, Takao FUNAKUBO | 2021-01-26 |
| 10777425 | Method of processing substrate | Masahiro Tabata, Toru Hisamatsu, Sho Kumakura, Shinya Ishikawa, Masanobu Honda | 2020-09-15 |
| 10734204 | Method for cleaning components of plasma processing apparatus | Takao FUNAKUBO | 2020-08-04 |
| 10626497 | Method for cleaning components of plasma processing apparatus | Takao FUNAKUBO | 2020-04-21 |
| 10304725 | Manufacturing methods to protect ULK materials from damage during etch processing to obtain desired features | Xinghua Sun, Takashi Yamamura, Hiroyuki Nagai, Katie Lutker-Lee | 2019-05-28 |
| 10083859 | Coating formation method and semiconductor device manufacturing method using the coating formation method | — | 2018-09-25 |
| 9892934 | Method for removing halogen and method for manufacturing semiconductor device | — | 2018-02-13 |
| 9780037 | Method of processing target object | Kazuya Kato, Toshihiko Shindo, Hiroshi Nagahata | 2017-10-03 |
| 8614140 | Semiconductor device manufacturing apparatus | Gousuke Shiraishi, Shigeru Tahara | 2013-12-24 |
| 8357615 | Method of manufacturing semiconductor device | Yuki Chiba, Eiichi Nishimura | 2013-01-22 |
| 8288252 | Method for recovering damaged components in lower region of low dielectric insulating film | Yusuke Ohsawa | 2012-10-16 |
| 8268721 | Semiconductor device and semiconductor device manufacturing method | — | 2012-09-18 |
| 8101507 | Semiconductor device manufacturing method and semiconductor device manufacturing apparatus | Gousuke Shiraishi, Shigeru Tahara | 2012-01-24 |
| 8075730 | Apparatus for manufacturing a semiconductor device | Satoru Shimura, Kazuhiro Kubota, Seiichi Takayama | 2011-12-13 |
| 8058153 | Method for recovering damage of low dielectric insulating film for manufacturing semiconductor device | Yusuke Ohsawa | 2011-11-15 |
| 7902077 | Semiconductor device manufacturing method that recovers damage of the etching target while supplying a predetermined recovery gas | Kaoru Maekawa, Yasushi Fujii | 2011-03-08 |