Issued Patents All Time
Showing 1–25 of 43 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12334343 | Substrate processing method and substrate processing system | Takayuki Katsunuma, Shinya Ishikawa, Yoshihide Kihara, Masanobu Honda | 2025-06-17 |
| 12300467 | Plasma processing method and plasma processing apparatus | Manabu Oie, Takanori BANSE | 2025-05-13 |
| 12071687 | Plasma processing method and plasma processing apparatus | Michiko Nakaya, Shinya Ishikawa, Sho Kumakura, Masanobu Honda, Yoshihide Kihara | 2024-08-27 |
| 12074009 | Apparatus for processing a substrate | Yuki Iijima, Kae KUMAGAI | 2024-08-27 |
| 11955337 | Substrate processing method and substrate processing system | Takayuki Katsunuma, Shinya Ishikawa, Yoshihide Kihara, Masanobu Honda | 2024-04-09 |
| 11823903 | Method for processing workpiece | Yoshihide Kihara, Tomoyuki Oishi | 2023-11-21 |
| 11594422 | Film etching method for etching film | Takayuki Hoshi, Masanobu Honda, Masahiro Tabata | 2023-02-28 |
| 11557485 | Plasma processing method and plasma processing apparatus | Yoshihide Kihara, Kensuke Taniguchi, Yoshinari Hatazaki | 2023-01-17 |
| 11545355 | Substrate processing method and substrate processing apparatus | Kae KUMAGAI, Masanobu Honda | 2023-01-03 |
| 11495469 | Method for processing substrates | Masanobu Honda, Yoshihide Kihara | 2022-11-08 |
| 11488836 | Apparatus for substrate processing | Masahiro Tabata, Sho Kumakura, Ryuichi Asako, Shinya Ishikawa, Masanobu Honda | 2022-11-01 |
| 11469111 | Substrate processing method and plasma processing apparatus | Shinya Ishikawa | 2022-10-11 |
| 11459655 | Plasma processing method and plasma processing apparatus | Michiko Nakaya, Shinya Ishikawa, Sho Kumakura, Masanobu Honda, Yoshihide Kihara | 2022-10-04 |
| 11264236 | Substrate processing method | Takayuki Katsunuma, Shinya Ishikawa, Yoshihide Kihara, Masanobu Honda | 2022-03-01 |
| 11244828 | Method for processing workpiece | Yoshihide Kihara, Tomoyuki Oishi | 2022-02-08 |
| 11244804 | Etching method, plasma processing apparatus, and processing system | Daisuke Nishide, Shinya Ishikawa | 2022-02-08 |
| 11201062 | Method and apparatus for processing a substrate | Yuki Iijima, Kae KUMAGAI | 2021-12-14 |
| 11139175 | Method of processing target object | Yoshihide Kihara, Masahiro Tabata | 2021-10-05 |
| 11133192 | Workpiece processing method | Masahiro Tabata, Yoshihide Kihara | 2021-09-28 |
| 11127598 | Film etching method for etching film | Takayuki Hoshi, Masanobu Honda, Masahiro Tabata | 2021-09-21 |
| 11114304 | Substrate processing method | Takayuki Katsunuma, Shinya Ishikawa, Yoshihide Kihara, Masanobu Honda, Maju TOMURA +1 more | 2021-09-07 |
| 11094551 | Plasma processing method and plasma processing apparatus | Yoshihide Kihara, Kensuke Taniguchi, Yoshinari Hatazaki | 2021-08-17 |
| 11081360 | Method for processing workpiece | Masahiro Tabata, Yoshihide Kihara, Masanobu Honda | 2021-08-03 |
| 10916420 | Processing method and plasma processing apparatus | Masahiro Tabata, Maju TOMURA, Sho Kumakura, Hironari Sasagawa | 2021-02-09 |
| 10886136 | Method for processing substrates | Masanobu Honda, Yoshihide Kihara | 2021-01-05 |