Issued Patents All Time
Showing 1–25 of 48 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12325919 | Apparatus for processing substrate | — | 2025-06-10 |
| 12308241 | Plasma processing method and plasma processing apparatus | Sho Kumakura | 2025-05-20 |
| 12051595 | Plasma processing method and plasma processing apparatus | — | 2024-07-30 |
| 11735423 | Workpiece processing method | — | 2023-08-22 |
| 11658036 | Apparatus for processing substrate | Yoshihide Kihara | 2023-05-23 |
| 11637025 | Apparatus for selectively etching first region made of silicon nitride against second region made of silicon oxide | Sho Kumakura | 2023-04-25 |
| 11594422 | Film etching method for etching film | Takayuki Hoshi, Masanobu Honda, Toru Hisamatsu | 2023-02-28 |
| 11574814 | Substrate and substrate processing method | Masahiro Tadokoro | 2023-02-07 |
| 11574806 | Film forming method | Sho Kumakura | 2023-02-07 |
| 11488836 | Apparatus for substrate processing | Toru Hisamatsu, Sho Kumakura, Ryuichi Asako, Shinya Ishikawa, Masanobu Honda | 2022-11-01 |
| 11380551 | Method of processing target object | Yoshihide Kihara | 2022-07-05 |
| 11322354 | Workpiece processing method | — | 2022-05-03 |
| 11289339 | Plasma processing method and plasma processing apparatus | — | 2022-03-29 |
| 11239090 | Plasma processing method and plasma processing apparatus | Sho Kumakura | 2022-02-01 |
| 11145518 | Method and apparatus for etching target object | Sho Kumakura | 2021-10-12 |
| 11139175 | Method of processing target object | Yoshihide Kihara, Toru Hisamatsu | 2021-10-05 |
| 11133192 | Workpiece processing method | Toru Hisamatsu, Yoshihide Kihara | 2021-09-28 |
| 11127598 | Film etching method for etching film | Takayuki Hoshi, Masanobu Honda, Toru Hisamatsu | 2021-09-21 |
| 11081360 | Method for processing workpiece | Toru Hisamatsu, Yoshihide Kihara, Masanobu Honda | 2021-08-03 |
| 10923332 | Plasma processing method | Ryuichi Asako, Takao FUNAKUBO | 2021-02-16 |
| 10916420 | Processing method and plasma processing apparatus | Toru Hisamatsu, Maju TOMURA, Sho Kumakura, Hironari Sasagawa | 2021-02-09 |
| 10903085 | Method for etching organic region | Ryuichi Asako, Takao FUNAKUBO | 2021-01-26 |
| 10781519 | Method and apparatus for processing substrate | — | 2020-09-22 |
| 10777425 | Method of processing substrate | Toru Hisamatsu, Sho Kumakura, Ryuichi Asako, Shinya Ishikawa, Masanobu Honda | 2020-09-15 |
| 10755944 | Etching method and plasma processing apparatus | Sho Kumakura | 2020-08-25 |