Issued Patents All Time
Showing 1–25 of 38 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12354837 | Plasma processing method and plasma processing apparatus | Takahiro Yonezawa, Shinya Ishikawa, Koki Tanaka, Sho Kumakura | 2025-07-08 |
| 12334343 | Substrate processing method and substrate processing system | Toru Hisamatsu, Shinya Ishikawa, Yoshihide Kihara, Masanobu Honda | 2025-06-17 |
| 12334331 | Substrate processing method and plasma processing apparatus | — | 2025-06-17 |
| 12154792 | Plasma etching method | — | 2024-11-26 |
| 12112954 | Etching method, substrate processing apparatus, and substrate processing system | Maju TOMURA, Tomohiko NIIZEKI, Hironari Sasagawa, Yuta NAKANE, Shinya Ishikawa +4 more | 2024-10-08 |
| 11969575 | Medical infusion pump, method of controlling medical infusion pump, and medical infusion pump system | Takafumi Nomura | 2024-04-30 |
| 11955337 | Substrate processing method and substrate processing system | Toru Hisamatsu, Shinya Ishikawa, Yoshihide Kihara, Masanobu Honda | 2024-04-09 |
| 11955316 | Substrate processing method, method for manufacturing semiconducor device, and plasma processing apparatus | Daisuke Nishide | 2024-04-09 |
| 11664236 | Method of etching film and plasma processing apparatus | — | 2023-05-30 |
| 11637003 | Method for etching film and plasma processing apparatus | Tomohiko NIIZEKI, Yoshihide Kihara, Maju TOMURA | 2023-04-25 |
| 11617830 | Medical pump, method of controlling medical pump, and medical pump system | — | 2023-04-04 |
| 11501975 | Substrate processing method and substrate processing apparatus | Daisuke Nishide | 2022-11-15 |
| 11476123 | Etching method, plasma processing apparatus, and substrate processing system | Masanobu Honda, Yuta NAKANE, Shinya Ishikawa | 2022-10-18 |
| 11443954 | Method and apparatus for controlling a shape of a pattern over a substrate | — | 2022-09-13 |
| 11417527 | Method and device for controlling a thickness of a protective film on a substrate | — | 2022-08-16 |
| 11264236 | Substrate processing method | Toru Hisamatsu, Shinya Ishikawa, Yoshihide Kihara, Masanobu Honda | 2022-03-01 |
| 11114304 | Substrate processing method | Toru Hisamatsu, Shinya Ishikawa, Yoshihide Kihara, Masanobu Honda, Maju TOMURA +1 more | 2021-09-07 |
| 10923360 | Method of etching film and plasma processing apparatus | — | 2021-02-16 |
| 10916442 | Etching method | — | 2021-02-09 |
| 10854430 | Plasma etching method | — | 2020-12-01 |
| 10854470 | Plasma etching method | — | 2020-12-01 |
| 10811274 | Etching method and plasma processing apparatus | — | 2020-10-20 |
| 10541147 | Etching method | Masahiro Tabata, Masanobu Honda | 2020-01-21 |
| 10195339 | Fluidic pump | — | 2019-02-05 |
| 10090191 | Selective plasma etching method of a first region containing a silicon atom and an oxygen atom | Maju TOMURA, Masanobu Honda | 2018-10-02 |