EN

Eiichi Nishimura

TL Tokyo Electron Limited: 80 patents #18 of 5,567Top 1%
OC Oki Electric Industry Co.: 7 patents #247 of 2,807Top 9%
HI Hitachi: 5 patents #7,555 of 28,497Top 30%
TL Tokyo Electron Yamanashi Limited: 4 patents #7 of 138Top 6%
KT Kabushiki Kaisha Toshiba: 2 patents #9,982 of 21,451Top 50%
NC Nippon Paint Holdings Co.: 1 patents #415 of 834Top 50%
MU Murakami: 1 patents #68 of 147Top 50%
TU Tohoku University: 1 patents #615 of 1,680Top 40%
Overall (All Time): #16,866 of 4,157,543Top 1%
93
Patents All Time

Issued Patents All Time

Showing 1–25 of 93 patents

Patent #TitleCo-InventorsDate
10975468 Method of cleaning plasma processing apparatus Hiroki Kishi, Mitsuru Hashimoto, Keiichi Shimoda, Akitaka Shimizu 2021-04-13
10923329 Substrate processing apparatus and substrate processing method Akitaka Shimizu, Fumiko Yamashita, Daisuke Urayama 2021-02-16
10626498 Method of processing target object to be processed Shigeru Tahara 2020-04-21
10236162 Method of etching porous film Shigeru Tahara, Mikhail Baklanov, Liping Zhang, Jean-Francois de Marneffe 2019-03-19
10217933 Method for etching multilayer film Mitsunori Ohata 2019-02-26
10074800 Method for etching magnetic layer including isopropyl alcohol and carbon dioxide Shigeru Tahara 2018-09-11
10053773 Method of cleaning plasma processing apparatus Hiroki Kishi, Mitsuru Hashimoto, Keiichi Shimoda, Akitaka Shimizu 2018-08-21
9882124 Etching method and substrate processing apparatus Akitaka Shimizu, Fumiko Yamashita 2018-01-30
9859102 Method of etching porous film Shigeru Tahara, Mikhail Baklanov, Liping Zhang, Jean-Francois de Marneffe 2018-01-02
9803286 Method for etching copper layer Keiichi Shimoda, Kei Nakayama 2017-10-31
9793130 Method for processing object to be processed Jun Sato 2017-10-17
9691643 Etching apparatus Tadashi Kotsugi, Fumiko Yamashita 2017-06-27
9660182 Plasma processing method and plasma processing apparatus Takashi Sone, Daisuke Urayama, Masato Kushibiki, Nao Koizumi, Wataru Kume +1 more 2017-05-23
9647206 Method for etching layer to be etched Mitsuru Hashimoto, Takashi Sone, Keiichi Shimoda 2017-05-09
9419211 Etching method and substrate processing apparatus Masato Kushibiki, Nao Koizumi, Takashi Sone, Fumiko Yamashita 2016-08-16
9412618 Pattern forming method Shinya Morikita, Fumiko Yamashita 2016-08-09
9340158 Outer mirror Toru Shimura 2016-05-17
9245764 Semiconductor device manufacturing method Tadashi Kotsugi, Fumiko Yamashita, Kenji Adachi 2016-01-26
9234083 Method and apparatus for forming a periodic pattern using a self-assembled block copolymer Fumiko Yamashita, Satoko Niitsuma 2016-01-12
9208997 Method of etching copper layer and mask Masato Kushibiki, Takashi Sone, Akitaka Shimizu, Fumiko Yamashita 2015-12-08
9177781 Plasma processing method and manufacturing method of semiconductor device Shigeru Tahara, Fumiko Yamashita, Hiroshi Tomita, Tokuhisa Ohiwa, Hisashi Okuchi +1 more 2015-11-03
9177816 Deposit removal method Shigeru Tahara, Takanori Matsumoto 2015-11-03
9165784 Substrate processing method and storage medium Masato Kushibiki, Fumiko Yamashita 2015-10-20
9150969 Method of etching metal layer Fumiko Yamashita, Koyumi SASA 2015-10-06
9126229 Deposit removal method Shigeru Tahara, Hiroshi Tomita, Tokuhisa Ohiwa, Hisashi Okuchi, Mitsuhiro Omura 2015-09-08