Issued Patents All Time
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10975468 | Method of cleaning plasma processing apparatus | Hiroki Kishi, Mitsuru Hashimoto, Eiichi Nishimura, Akitaka Shimizu | 2021-04-13 |
| 10944051 | Method of cleaning a substrate processing apparatus and the substrate processing apparatus performing the method | Takuya Kubo, Song yun Kang, Tetsuya Ohishi | 2021-03-09 |
| 10403814 | Method of cleaning and method of plasma processing | Takuya Kubo, Song yun Kang, Tetsuya Ohishi | 2019-09-03 |
| 10053773 | Method of cleaning plasma processing apparatus | Hiroki Kishi, Mitsuru Hashimoto, Eiichi Nishimura, Akitaka Shimizu | 2018-08-21 |
| 9803286 | Method for etching copper layer | Eiichi Nishimura, Kei Nakayama | 2017-10-31 |
| 9647206 | Method for etching layer to be etched | Mitsuru Hashimoto, Takashi Sone, Eiichi Nishimura | 2017-05-09 |
| 5356719 | Fluorosilicone release agent composition | Yuji Hamada | 1994-10-18 |