Issued Patents All Time
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12009204 | Bias temperature instability of SiO2 layers | Jacopo Franco, Tibor Grasser | 2024-06-11 |
| 11495490 | Semiconductor device manufacturing method | Koichi Yatsuda, Tatsuya Yamaguchi, Yannick Feurprier, Frederic Lazzarino, Khashayar Babaei Gavan | 2022-11-08 |
| 11056376 | Removing an organic sacrificial material from a two-dimensional material | Boon Teik Chan, Daniil Marinov, Han-Chung Lin, Inge Asselberghs | 2021-07-06 |
| 10910259 | Semiconductor device manufacturing method | Koichi Yatsuda, Tatsuya Yamaguchi, Yannick Feurprier, Frederic Lazzarino, Khashayar Babaei Gavan | 2021-02-02 |
| 10236162 | Method of etching porous film | Shigeru Tahara, Eiichi Nishimura, Mikhail Baklanov, Liping Zhang | 2019-03-19 |
| 9859102 | Method of etching porous film | Shigeru Tahara, Eiichi Nishimura, Mikhail Baklanov, Liping Zhang | 2018-01-02 |
| 9847262 | Method and apparatus for real-time monitoring of plasma etch uniformity | Vladimir Samara | 2017-12-19 |
| 9595422 | Plasma etching of porous substrates | Mikhail Baklanov, Liping Zhang | 2017-03-14 |
| 9520298 | Plasma method for reducing post-lithography line width roughness | Peter De Schepper, Efrain Altamirano Sanchez | 2016-12-13 |