Issued Patents All Time
Showing 1–25 of 41 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12324175 | FET device and a method for forming a FET device | Julien Ryckaert, Naoto Horiguchi | 2025-06-03 |
| 12237371 | Method for forming a semiconductor device | Hans Mertens, Eugenio Dentoni Litta | 2025-02-25 |
| 12237207 | Method for forming a buried metal line in a semiconductor substrate | Zheng Tao, Efrain Altamirano Sanchez, Anshul Gupta, Basoene Briggs | 2025-02-25 |
| 12154832 | Method for forming a semiconductor device and a semiconductor device | Hans Mertens | 2024-11-26 |
| 11862452 | Contact isolation in semiconductor devices | Waikin Li, Zheng Tao | 2024-01-02 |
| 11854803 | Gate spacer patterning | Pierre Morin, Antony Premkumar Peter | 2023-12-26 |
| 11824122 | Method for filling a space in a semiconductor | Waikin Li, Zheng Tao | 2023-11-21 |
| 11682591 | Method for forming transistor structures | Juergen Boemmels, Basoene Briggs | 2023-06-20 |
| 11638391 | Method for processing a semiconductor device with two closely spaced gates | Ruoyu Li, Stefan Kubicek, Julien Jussot | 2023-04-25 |
| 11610980 | Method for processing a FinFET device | Changyong Xiao, Jie Chen | 2023-03-21 |
| 11545401 | Isolated semiconductor layer stacks for a semiconductor device | Eugenio Dentoni Litta, Liping Zhang | 2023-01-03 |
| 11527431 | Methods of semiconductor device processing | Efrain Altamirano Sanchez, Geert Mannaert | 2022-12-13 |
| 11488826 | Self-aligned layer patterning | Yong Kong Siew, Juergen Boemmels | 2022-11-01 |
| 11430876 | Method for producing self-aligned gate and source/drain via connections for contacting a FET transistor | Dunja Radisic, Steven Demuynck, Efrain Altamirano Sanchez, Soon Aik Chew | 2022-08-30 |
| 11430697 | Method of forming a mask layer | Zheng Tao, Efrain Altamirano Sanchez | 2022-08-30 |
| 11348842 | Split replacement metal gate integration | Eugenio Dentoni Litta, Steven Demuynck | 2022-05-31 |
| 11335597 | Method for forming a buried metal line | Eugenio Dentoni Litta, Anshul Gupta, Julien Ryckaert | 2022-05-17 |
| 11107812 | Method of fabricating stacked semiconductor device | Zheng Tao, Steven Demuynck | 2021-08-31 |
| 11056376 | Removing an organic sacrificial material from a two-dimensional material | Jean-Francois de Marneffe, Daniil Marinov, Han-Chung Lin, Inge Asselberghs | 2021-07-06 |
| 10978335 | Method for producing a gate cut structure on an array of semiconductor fins | Efrain Altamirano Sanchez, Ryan Ryoung-Han Kim | 2021-04-13 |
| 10825682 | Method for producing a pillar structure in a semiconductor layer | Vasile Paraschiv, Efrain Altamirano Sanchez, Zheng Tao | 2020-11-03 |
| 10790382 | Method for forming horizontal nanowires and devices manufactured thereof | Silvia Armini, Elisabeth Camerotto, Zheng Tao | 2020-09-29 |
| 10782607 | Reticles for lithography | Kim Vu Luong, Vicky Philipsen, Efrain Altamirano Sanchez, Kevin Vandersmissen | 2020-09-22 |
| 10784158 | Area-selective deposition of a tantalum silicide TaSix mask material | Efrain Altamirano Sanchez | 2020-09-22 |
| 10493378 | Method of forming micro-pipes on a substrate and a structure formed thereof | Zheng Tao, XiuMei Xu, Khashayar Babaei Gavan, Efrain Altamirano Sanchez | 2019-12-03 |