YS

Yong Kong Siew

CM Chartered Semiconductor Manufacturing: 8 patents #80 of 840Top 10%
Samsung: 8 patents #15,984 of 75,807Top 25%
GP Globalfoundries Singapore Pte.: 2 patents #291 of 828Top 40%
IV Imec Vzw: 1 patents #463 of 1,046Top 45%
Overall (All Time): #233,727 of 4,157,543Top 6%
19
Patents All Time

Issued Patents All Time

Showing 1–19 of 19 patents

Patent #TitleCo-InventorsDate
12132001 Semiconductor devices and methods of manufacturing semiconductor devices Wei-Hsiung Tseng, Changhwa Kim 2024-10-29
11804438 Semiconductor devices and methods of manufacturing semiconductor devices Wei-Hsiung Tseng, Changhwa Kim 2023-10-31
11488826 Self-aligned layer patterning Boon Teik Chan, Juergen Boemmels 2022-11-01
11335637 Semiconductor devices and methods of manufacturing semiconductor devices Wei-Hsiung Tseng, Changhwa Kim 2022-05-17
10396034 Semiconductor devices and methods of manufacturing semiconductor devices Wei-Hsiung Tseng, Changhwa Kim 2019-08-27
10079147 Method of forming interconnects for semiconductor devices Sung-yup Jung 2018-09-18
9997402 Method of manufacturing a wiring structure on a self-forming barrier pattern 2018-06-12
9865594 Semiconductor devices Sang-Hoon Ahn 2018-01-09
9793158 Methods of fabricating a semiconductor device Hyunsu Kim 2017-10-17
8519445 Poly profile engineering to modulate spacer induced stress for device enhancement Vincent Ho, Wenhe Lin, Young Way Teh, Bei Chao Zhang, Fan Zhang +2 more 2013-08-27
7993997 Poly profile engineering to modulate spacer induced stress for device enhancement Vincent Ho, Wenhe Lin, Young Way Teh, Bei Chao Zhang, Fan Zhang +2 more 2011-08-09
7947604 Method for corrosion prevention during planarization Fan Zhang, Lup San Leong, Bei Chao Zhang 2011-05-24
7833900 Interconnections for integrated circuits including reducing an overburden and annealing Lup San Leong, Liang-Choo Hsia 2010-11-16
7670946 Methods to eliminate contact plug sidewall slit Beichao Zhang 2010-03-02
7524755 Entire encapsulation of Cu interconnects using self-aligned CuSiN film Johnny Widodo, Bei Chao Zhang, Tong Qing Chen, Fan Zhang, San Leong Liew +2 more 2009-04-28
7247555 Method to control dual damascene trench etch profile and trench depth uniformity Hai Cong, Liang-Choo Hsia 2007-07-24
6406975 Method for fabricating an air gap shallow trench isolation (STI) structure Victor Lim, Young Way Teh, Ting Cheong Ang, Alex See 2002-06-18
6380106 Method for fabricating an air gap metallization scheme that reduces inter-metal capacitance of interconnect structures Seng-Keong Victor Lim, Young Way Teh, Ting Cheong Ang, Alex See 2002-04-30
6121135 Modified buried contact process for IC device fabrication Lap Chan 2000-09-19