Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
PS

Peter De Schepper — 10 Patents

INInpria: 6 patents #15 of 43Top 35%
IVImec Vzw: 2 patents #272 of 1,046Top 30%
KRKatholieke Universiteit Leuven, Ku Leuven R&D: 1 patents #173 of 512Top 35%
Overall (All Time): #481,000 of 4,157,543Top 15%
10 Patents All Time
Peter De Schepper has been granted 10 US patents while listed as an inventor at Inpria. The first was granted in 2016 and the most recent in December 2025. Peter De Schepper ranks #481,000 of 4,157,543 US inventors in our database (top 11.6%). Patent records list Peter De Schepper in Wijnegem, TX, BE.

Issued Patents All Time

Showing 1–10 of 10 patents

Patent #TitleCo-InventorsDate
12498641 Process environment for inorganic resist patterning Alan J. Telecky, Jason K. Stowers, Douglas A. Keszler, Stephen T. Meyers, Sonia Castellanos Ortega +2 more 2025-12-16
12399426 Patterned organometallic photoresists and methods of patterning Michael Kocsis, Michael Greer, Shu-Hao Chang 2025-08-26
12360454 Stabilized interfaces of inorganic radiation patterning compositions on substrates Brian J. Cardineau, Shu-Hao Chang, Jason K. Stowers, Michael Kocsis 2025-07-15
12072626 Organometallic radiation patternable coatings with low defectivity and corresponding methods Benjamin L. Clark, Gaetano Giordano, Shu-Hao Chang, Dominick Smiddy, Mark Geniza +2 more 2024-08-27
11947262 Process environment for inorganic resist patterning Alan J. Telecky, Jason K. Stowers, Douglas A. Keszler, Stephen T. Meyers, Sonia Castellanos Ortega +2 more 2024-04-02
11886116 Multiple patterning with organometallic photopatternable layers with intermediate freeze steps Jason K. Stowers, Sangyoon Woo, Michael Kocsis, Alan J. Telecky 2024-01-30
11480874 Patterned organometallic photoresists and methods of patterning Michael Kocsis, Michael Greer, Shu-Hao Chang 2022-10-25
D898598 Water proof water sensor Ronald B. Roth 2020-10-13
10490442 Method for blocking a trench portion Boon Teik Chan, Ming-Ray Mao, Michael Kocsis 2019-11-26
9520298 Plasma method for reducing post-lithography line width roughness Jean-Francois de Marneffe, Efrain Altamirano Sanchez 2016-12-13