Issued Patents All Time
Showing 1–25 of 40 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12412748 | Plasma processing with magnetic ring X point | Peter Ventzek | 2025-09-09 |
| 12272520 | Process control enabled VDC sensor for plasma process | Merritt Funk, Peter Ventzek, Alok Ranjan, Justin Moses, Chelsea DuBose | 2025-04-08 |
| 12261017 | Resonant antenna for physical vapor deposition applications | Masaki Takagi | 2025-03-25 |
| 12224164 | Radio frequency (RF) system with embedded RF signal pickups | Chelsea DuBose, Merritt Funk, Justin Moses, Yohei Yamazawa | 2025-02-11 |
| 12176183 | RF voltage and current (V-I) sensors and measurement methods | Merritt Funk, Yohei Yamazawa, Justin Moses, Chelsea DuBose, Michael Hummel | 2024-12-24 |
| 12119207 | Apparatus for plasma processing | Merritt Funk | 2024-10-15 |
| 12074390 | Parallel resonance antenna for radial plasma control | Chelsea DuBose, Merritt Funk, Justin Moses | 2024-08-27 |
| 11942307 | Plasma processing with radio frequency (RF) source and bias signal waveforms | Zhiying Chen, Yun Han, Peter Ventzek, Alok Ranjan | 2024-03-26 |
| 11817296 | RF voltage and current (V-I) sensors and measurement methods | Merritt Funk, Yohei Yamazawa, Justin Moses, Chelsea DuBose, Michael Hummel | 2023-11-14 |
| 11600474 | RF voltage and current (V-I) sensors and measurement methods | Merritt Funk, Yohei Yamazawa, Justin Moses, Chelsea DuBose, Michael Hummel | 2023-03-07 |
| 11551909 | Ultra-localized and plasma uniformity control in a plasma processing system | Peter Ventzek | 2023-01-10 |
| 11515122 | System and methods for VHF plasma processing | — | 2022-11-29 |
| 11410832 | RF measurement system and method | Merritt Funk, Yohei Yamazawa, Chelsea DuBose | 2022-08-09 |
| 11393663 | Methods and systems for focus ring thickness determinations and feedback control | Merritt Funk, Alok Ranjan, Peter Ventzek, Justin Moses, Chelsea DuBose | 2022-07-19 |
| 11348761 | Impedance matching apparatus and control method | John Carroll, Jianping Zhao, Peter Ventzek | 2022-05-31 |
| 11201035 | Radical source with contained plasma | Peter Ventzek | 2021-12-14 |
| 11043362 | Plasma processing apparatuses including multiple electron sources | Peter Ventzek, Zhiying Chen, Alok Ranjan | 2021-06-22 |
| 11037798 | Self-limiting cyclic etch method for carbon-based films | Nasim Eibagi, Alok Ranjan, Peter Ventzek | 2021-06-15 |
| 11037765 | Resonant structure for electron cyclotron resonant (ECR) plasma ionization | — | 2021-06-15 |
| 10991554 | Plasma processing system with synchronized signal modulation | Jianping Zhao, Peter Ventzek | 2021-04-27 |
| 10861679 | Resonant structure for a plasma processing system | — | 2020-12-08 |
| 10459334 | Facilitation of orthotopic patterns during substrate fabrication | — | 2019-10-29 |
| 10354841 | Plasma generation and control using a DC ring | Jianping Zhao, Lee Chen, Merritt Funk, Radha Sundararajan | 2019-07-16 |
| 10002744 | System and method for controlling plasma density | Lee Chen, Peter L. G. Ventzek | 2018-06-19 |
| 9396900 | Radio frequency (RF) power coupling system utilizing multiple RF power coupling elements for control of plasma properties | Lee Chen, Peter L. G. Ventzek, Merritt Funk, Jianping Zhao, Radha Sundararajan | 2016-07-19 |