Issued Patents All Time
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10249498 | Method for using heated substrates for process chemistry control | Hirokazu Ueda | 2019-04-02 |
| 10002744 | System and method for controlling plasma density | Lee Chen, Barton Lane | 2018-06-19 |
| 9658106 | Plasma processing apparatus and measurement method | Yuuki Kobayashi, Hirokazu Ueda, Kohei Yamashita | 2017-05-23 |
| 9165771 | Pulsed gas plasma doping method and apparatus | Takenao Nemoto, Hirokazu Ueda, Yuuki Kobayashi, Masahiro Horigome | 2015-10-20 |