| 9178006 |
Methods to improve electrical performance of ZrO2 based high-K dielectric materials for DRAM applications |
Xiangxin Rui, Hanhong Chen, Naonori Fujiwara, Imran Hashim |
2015-11-03 |
| 8880216 |
Picking system |
Tetsuro Izumi, Kenji Matsukuma, Yukio Hashiguchi |
2014-11-04 |
| 8880217 |
Picking system |
Tetsuro Izumi, Kenji Matsukuma, Yukio Hashiguchi |
2014-11-04 |
| 8606400 |
Robot system |
Tetsuro Izumi, Kenji Matsukuma, Yukio Hashiguchi |
2013-12-10 |
| 8574998 |
Leakage reduction in DRAM MIM capacitors |
Sandra G. Malhotra, Hiroyuki Ode, Xiangxin Rui, Takashi Arao, Naonori Fujiwara |
2013-11-05 |
| 8546236 |
High performance dielectric stack for DRAM capacitor |
Sandra G. Malhotra, Hanhong Chen, Wim Deweerd, Mitsuhiro Horikawa, Hiroyuki Ode +1 more |
2013-10-01 |
| 8541283 |
High performance dielectric stack for DRAM capacitor |
Sandra G. Malhotra, Hanhong Chen, Wim Deweerd, Mitsuhiro Horikawa, Hiroyuki Ode +1 more |
2013-09-24 |
| 8476141 |
High performance dielectric stack for DRAM capacitor |
Sandra G. Malhotra, Hanhong Chen, Wim Deweerd, Mitsuhiro Horikawa, Hiroyuki Ode +1 more |
2013-07-02 |
| 8415227 |
High performance dielectric stack for DRAM capacitor |
Sandra G. Malhotra, Wim Deweerd, Hanhong Chen, Xiangxin Rui, Hiroyuki Ode +1 more |
2013-04-09 |
| 8277891 |
Method for suppressing particle generation during semiconductor manufacturing |
Yuichiro Morozumi, Takashi Arao, Kazunori Une |
2012-10-02 |
| 7771535 |
Semiconductor manufacturing apparatus |
— |
2010-08-10 |
| 7763500 |
Method for manufacturing semiconductor storage device comprising a slow cooling step |
Takashi Arao, Kenji Komeda, Naruhiko Nakanishi, Hideki Gomi |
2010-07-27 |
| 7741173 |
Method for forming a metal oxide film |
Hiroshi Sakuma |
2010-06-22 |
| 7576016 |
Process for manufacturing semiconductor device |
Takashi Arao |
2009-08-18 |
| 7303973 |
ALD process for capacitor dielectric |
Hiroshi Sakuma |
2007-12-04 |
| 7256144 |
Method for forming a metal oxide film |
Hiroshi Sakuma |
2007-08-14 |
| 7224016 |
Memory with memory cells that include a MIM type capacitor with a lower electrode made for reduced resistance at an interface with a metal film |
Yoshitaka Nakamura, Hidekazu Goto, Isamu Asano, Mitsuhiro Horikawa, Keiji Kuroki +2 more |
2007-05-29 |
| 6939760 |
Method for semiconductor device manufacturing to include multistage chemical vapor deposition of material oxide film |
Hirofumi Fujioka, Hiroyuki Kitamura |
2005-09-06 |
| 6509200 |
Method of appraising a dielectric film, method of calibrating temperature of a heat treatment device, and method of fabricating a semiconductor memory device |
— |
2003-01-21 |
| 6346302 |
High density plasma enhanced chemical vapor deposition method |
Koji Kishimoto |
2002-02-12 |
| 6191002 |
Method of forming trench isolation structure |
— |
2001-02-20 |
| 6187693 |
Heat treatment of a tantalum oxide film |
— |
2001-02-13 |
| 6033990 |
Method for manufacturing a multilevel interconnection structure |
Koji Kishimoto |
2000-03-07 |
| 6005291 |
Semiconductor device and process for production thereof |
Kunihiro Fujii, Tatsuya Usami, Koji Kishimoto |
1999-12-21 |
| 5891234 |
Spin on glass material and method for forming a semiconductor device by using improved spin on glass material |
Koji Kishimoto, Tetsuya Homma |
1999-04-06 |