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Semiconductor memory device |
Katsuyoshi KOMATSU, Hiroki TOKUHIRA, Hiroshi TAKEHIRA, Jieqiong ZHANG |
2025-05-06 |
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Semiconductor memory device |
Kotaro NODA |
2024-01-30 |
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Semiconductor storage device |
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2023-12-26 |
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| 11508906 |
Semiconductor memory device |
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2022-11-22 |
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| 11387276 |
Nonvolatile semiconductor storage device and method of manufacturing the same |
Kotaro NODA |
2022-07-12 |
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| 11349073 |
Semiconductor memory device |
Kotaro NODA |
2022-05-31 |
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| 11145590 |
Semiconductor memory device and method of manufacturing the same |
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2021-10-12 |
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| 10211259 |
Semiconductor memory device and method of manufacturing the same |
Atsushi OGA, Mutsumi Okajima, Natsuki Fukuda, Takeshi Yamaguchi, Toshiharu Tanaka |
2019-02-19 |
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| 10074694 |
Memory device and method for manufacturing the same |
Takeshi Takagi, Takeshi Yamaguchi, Masaki Yamato, Toshiharu Tanaka |
2018-09-11 |
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| 9905759 |
Memory device and method for manufacturing the same |
Takeshi Takagi, Takeshi Yamaguchi, Masaki Yamato, Toshiharu Tanaka |
2018-02-27 |
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| 9721961 |
Semiconductor memory device |
Mutsumi Okajima, Atsushi OGA, Takeshi Yamaguchi, Toshiharu Tanaka, Natsuki Fukuda |
2017-08-01 |
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| 9704922 |
Semiconductor memory device and method of manufacturing the same while avoiding process damage to a variable resistance film |
Atsushi OGA, Mutsumi Okajima, Takeshi Yamaguchi, Toshiharu Tanaka, Natsuki Fukuda |
2017-07-11 |
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| 9559300 |
Resistive random access memory device and manufacturing method thereof |
Takeshi Yamaguchi, Takeshi Takagi, Toshiharu Tanaka, Masaki Yamato |
2017-01-31 |
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| 9418737 |
Nonvolatile semiconductor memory device and method of controlling the same |
Takeshi Takagi, Masaki Yamato, Takeshi Yamaguchi, Toshiharu Tanaka |
2016-08-16 |
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| 9336880 |
Nonvolatile memory device and method of controlling the same |
Takeshi Takagi, Masaki Yamato, Takeshi Yamaguchi, Toshiharu Tanaka |
2016-05-10 |
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Nonvolatile memory device and method for manufacturing same |
Shigeki Kobayashi, Takeshi Yamaguchi, Masaki Yamato, Yoshinori NAKAKUBO |
2015-12-29 |
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High work function, manufacturable top electrode |
Sandra G. Malhotra, Hanhong Chen, Wim Deweerd, Arthur Gevondyan |
2015-12-29 |
$129,000 |
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Resistance change element and method for manufacturing same |
Takeshi Yamaguchi, Masaki Yamato, Shigeki Kobayashi, Yoshinori NAKAKUBO |
2015-12-08 |
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Adsorption site blocking method for co-doping ALD films |
Sandra G. Malhotra, Hanhong Chen, Wim Deweerd, Toshiyuki Hirota |
2015-11-03 |
$43,000 |
| 9129850 |
Semiconductor device manufacturing method |
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2015-09-08 |
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Methods for reproducible flash layer deposition |
Sandra G. Malhotra, Xiangxin Rui |
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$190,000 |
| 9012298 |
Methods for reproducible flash layer deposition |
Sandra G. Malhotra, Xiangxin Rui |
2015-04-21 |
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| 8975633 |
Molybdenum oxide top electrode for DRAM capacitors |
Hanhong Chen, Wim Deweerd |
2015-03-10 |
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| 8912628 |
Semiconductor device and method for manufacturing the same |
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2014-12-16 |
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| 8906812 |
Wet etch and clean chemistries for MoOx |
Wim Deweerd, Kim Van Berkel |
2014-12-09 |
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