HC

Hanhong Chen

IN Intermolecular: 53 patents #8 of 248Top 4%
EM Elpida Memory: 29 patents #12 of 692Top 2%
Applied Materials: 13 patents #1,030 of 7,310Top 15%
RJ Rutgers, The State University Of New Jersey: 1 patents #651 of 1,498Top 45%
Overall (All Time): #30,771 of 4,157,543Top 1%
68
Patents All Time

Issued Patents All Time

Showing 25 most recent of 68 patents

Patent #TitleCo-InventorsDate
12340980 Plasma showerhead with improved uniformity Chaowei Wang, Kenneth Brian Doering, Kartik Shah, Kevin Griffin, Hao Zhang 2025-06-24
12305283 Dithering or dynamic offsets for improved uniformity Joseph AuBuchon, Sanjeev Baluja, Michael R. Rice, Arkaprava Dan 2025-05-20
12119221 PEALD nitride films Philip Allan Kraus, Joseph AuBuchon 2024-10-15
12077861 Dithering or dynamic offsets for improved uniformity Joseph AuBuchon, Sanjeev Baluja, Michael R. Rice, Arkaprava Dan 2024-09-03
11955331 Method of forming silicon nitride films using microwave plasma Kelvin Chan, Philip Allan Kraus, Thai Cheng Chua 2024-04-09
11823870 PEALD titanium nitride with direct microwave plasma Arkaprava Dan, Joseph AuBuchon, Kyoung Ha Kim, Philip Allan Kraus 2023-11-21
11761083 Methods for controlling a flow pulse shape Joseph AuBuchon, Kevin Griffin 2023-09-19
11626281 PEALD nitride films Philip Allan Kraus, Joseph AuBuchon 2023-04-11
11586789 Machine learning based smart process recipe builder to improve azimuthal flow and thickness uniformity Dhritiman Subha Kashyap, Chaowei Wang, Kartik Shah, Kevin Griffin, Karthik Ramanathan +2 more 2023-02-21
11315769 Plasma source for rotating susceptor Kallol Bera, Anantha K. Subramani, John C. Forster, Philip Allan Kraus, Farzad Houshmand 2022-04-26
11220747 Complementary pattern station designs Joseph AuBuchon, Sanjeev Baluja, Michael R. Rice, Arkaprava Dan 2022-01-11
10985009 Methods to deposit flowable (gap-fill) carbon containing films using various plasma sources Lakmal C. Kalutarage, Mark Saly, David Thompson, William J. Durand, Kelvin Chan +1 more 2021-04-20
10903056 Plasma source for rotating susceptor Kallol Bera, Anantha K. Subramani, John C. Forster, Philip Allan Kraus, Farzad Houshmand 2021-01-26
9281357 DRAM MIM capacitor using non-noble electrodes David Chi, Imran Hashim, Mitsuhiro Horikawa, Sandra G. Malhotra 2016-03-08
9224878 High work function, manufacturable top electrode Sandra G. Malhotra, Wim Deweerd, Arthur Gevondyan, Hiroyuki Ode 2015-12-29
9178006 Methods to improve electrical performance of ZrO2 based high-K dielectric materials for DRAM applications Xiangxin Rui, Naonori Fujiwara, Imran Hashim, Kenichi Koyanagi 2015-11-03
9178010 Adsorption site blocking method for co-doping ALD films Sandra G. Malhotra, Wim Deweerd, Toshiyuki Hirota, Hiroyuki Ode 2015-11-03
9082782 Inexpensive electrode materials to facilitate rutile phase titanium oxide Toshiyuki Hirota, Pragati Kumar, Xiangxin Rui, Sunil Shanker 2015-07-14
8980744 Inexpensive electrode materials to facilitate rutile phase titanium oxide Toshiyuki Hirota, Pragati Kumar, Xiangxin Rui, Sunil Shanker 2015-03-17
8975147 Enhanced work function layer supporting growth of rutile phase titanium oxide Xiangxin Rui, Pragati Kumar, Sandra G. Malhotra 2015-03-10
8975633 Molybdenum oxide top electrode for DRAM capacitors Wim Deweerd, Hiroyuki Ode 2015-03-10
8969169 DRAM MIM capacitor using non-noble electrodes David Chi, Imran Hashim, Mitsuhiro Horikawa, Sandra G. Malhotra 2015-03-03
8900418 Yttrium and titanium high-k dielectric films Imran Hashim, Tony P. Chiang, Indranil De, Nobi Fuchigami, Edward Haywood +3 more 2014-12-02
8900422 Yttrium and titanium high-K dielectric film Imran Hashim, Indranil De, Tony P. Chiang, Edward Haywood, Nobi Fuchigami +3 more 2014-12-02
8901708 Yttrium and titanium high-k dielectric films Imran Hashim, Tony P. Chiang, Indranil De, Nobumichi Fuchigami, Edward Haywood +3 more 2014-12-02