Issued Patents All Time
Showing 26–50 of 68 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8878269 | Band gap improvement in DRAM capacitors | Wim Deweerd, Sandra G. Malhotra, Hiroyuki Ode | 2014-11-04 |
| 8859301 | System and method for step coverage measurement | Edward Haywood, Pragati Kumar | 2014-10-14 |
| 8853049 | Single-sided non-noble metal electrode hybrid MIM stack for DRAM devices | Wim Deweerd, Hiroyuki Ode, Xiangxin Rui | 2014-10-07 |
| 8847397 | High work function, manufacturable top electrode | Sandra G. Malhotra, Wim Deweerd, Arthur Gevondyan, Hiroyuki Ode | 2014-09-30 |
| 8835756 | Zinc oxide photoelectrodes and methods of fabrication | Yicheng Lu, Aurelien Du Pasquier | 2014-09-16 |
| 8835273 | High temperature ALD process of metal oxide for DRAM applications | Edward Haywood, Sandra G. Malhotra, Hiroyuki Ode | 2014-09-16 |
| 8836002 | Method for fabricating a DRAM capacitor | Karthik Ramani, Wim Deweerd, Nobumichi Fuchigami, Hiroyuki Ode | 2014-09-16 |
| 8829647 | High temperature ALD process for metal oxide for DRAM applications | Edward Haywood, Sandra G. Malhotra, Hiroyuki Ode | 2014-09-09 |
| 8828821 | Fabrication of semiconductor stacks with ruthenium-based materials | Nobumichi Fuchigami, Imran Hashim, Pragati Kumar, Sandra G. Malhotra, Sunil Shanker | 2014-09-09 |
| 8813325 | Method for fabricating a DRAM capacitor | Karthik Ramani, Nobumichi Fuchigami, Wim Deweerd, Hiroyuki Ode | 2014-08-26 |
| 8815677 | Method of processing MIM capacitors to reduce leakage current | Wim Deweerd, Xiangxin Rui, Sandra G. Malhotra, Hiroyuki Ode | 2014-08-26 |
| 8809160 | Methods for forming high-K crystalline films and related devices | Edward Haywood, Pragati Kumar, Sandra G. Malhotra, Xiangxin Rui | 2014-08-19 |
| 8772123 | Band gap improvement in DRAM capacitors | Sandra G. Malhotra, Wim Deweerd, Hiroyuki Ode | 2014-07-08 |
| 8765569 | Molybdenum oxide top electrode for DRAM capacitors | Wim Deweerd, Hiroyuki Ode | 2014-07-01 |
| 8737036 | Titanium based high-K dielectric films | Nobumichi Fuchigami, Imran Hashim, Edward Haywood, Pragati Kumar, Sandra G. Malhotra +3 more | 2014-05-27 |
| 8674479 | Method for producing MIM capacitors with high K dielectric materials and non-noble electrodes | Pragati Kumar | 2014-03-18 |
| 8652927 | Integration of non-noble DRAM electrode | Sandra G. Malhotra, Wim Deweerd, Edward Haywood, Hiroyuki Ode, Gerald Richardson | 2014-02-18 |
| 8647943 | Enhanced non-noble electrode layers for DRAM capacitor cell | Wim Deweerd, Edward Haywood, Sandra G. Malhotra, Hiroyuki Ode | 2014-02-11 |
| 8581319 | Semiconductor stacks including catalytic layers | Sandra G. Malhotra, Hiroyuki Ode, Xiangxin Rui | 2013-11-12 |
| 8581318 | Enhanced non-noble electrode layers for DRAM capacitor cell | Wim Deweerd, Edward Haywood, Sandra G. Malhotra, Hiroyuki Ode | 2013-11-12 |
| 8575671 | Asymmetric MIM capacitor for DRAM devices | Hiroyuki Ode | 2013-11-05 |
| 8574999 | Blocking layers for leakage current reduction in DRAM devices | Sandra G. Malhotra, Wim Deweerd, Hiroyuki Ode | 2013-11-05 |
| 8574997 | Method of using a catalytic layer to enhance formation of a capacitor stack | Sandra G. Malhotra, Hiroyuki Ode, Xiangxin Rui | 2013-11-05 |
| 8569818 | Blocking layers for leakage current reduction in DRAM devices | Sandra G. Malhotra, Wim Deweerd, Hiroyuki Ode | 2013-10-29 |
| 8551851 | Titanium-based high-K dielectric films | Pragati Kumar, Sunil Shanker, Edward Haywood, Sandra G. Malhotra, Imran Hashim +3 more | 2013-10-08 |