Issued Patents All Time
Showing 25 most recent of 29 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12068153 | Situ clean for bevel and edge ring | Kaushik Alayavalli, Andrew Nguyen, Lu Liu, Malav Kapadia | 2024-08-20 |
| 11587764 | Magnetic housing systems | Srinivas Gandikota, Tza-Jing Gung, Samuel E. Gottheim, Timothy Joseph Franklin, Pramit Manna +3 more | 2023-02-21 |
| 11560626 | Substrate processing chamber | Timothy Joseph Franklin, Adam J. Fischbach, Abhijit Basu Mallick, Pramit Manna, Carlaton WONG +2 more | 2023-01-24 |
| 11557466 | Tuneable uniformity control utilizing rotational magnetic housing | Samuel E. Gottheim, Abhijit Basu Mallick, Pramit Manna, Eswaranand Venkatasubramanian, Timothy Joseph Franklin +2 more | 2023-01-17 |
| 11270905 | Modulating film properties by optimizing plasma coupling materials | Eswaranand Venkatasubramanian, Samuel E. Gottheim, Pramit Manna, Kien N. Chuc, Adam J. Fischbach +2 more | 2022-03-08 |
| 11189517 | RF electrostatic chuck filter circuit | Zheng John Ye, Adam J. Fischbach, Timothy Joseph Franklin | 2021-11-30 |
| 9607904 | Atomic layer deposition of HfAlC as a metal gate workfunction material in MOS devices | Albert S. Lee, Paul R. Besser, Kisik Choi, Hoon Kim, Salil Mujumdar | 2017-03-28 |
| 8906160 | Vapor based processing system with purge mode | Richard Endo | 2014-12-09 |
| 8900418 | Yttrium and titanium high-k dielectric films | Imran Hashim, Hanhong Chen, Tony P. Chiang, Indranil De, Nobi Fuchigami +3 more | 2014-12-02 |
| 8900422 | Yttrium and titanium high-K dielectric film | Imran Hashim, Indranil De, Tony P. Chiang, Hanhong Chen, Nobi Fuchigami +3 more | 2014-12-02 |
| 8901708 | Yttrium and titanium high-k dielectric films | Imran Hashim, Hanhong Chen, Tony P. Chiang, Indranil De, Nobumichi Fuchigami +3 more | 2014-12-02 |
| 8859301 | System and method for step coverage measurement | Hanhong Chen, Pragati Kumar | 2014-10-14 |
| 8835273 | High temperature ALD process of metal oxide for DRAM applications | Hanhong Chen, Sandra G. Malhotra, Hiroyuki Ode | 2014-09-16 |
| 8829647 | High temperature ALD process for metal oxide for DRAM applications | Hanhong Chen, Sandra G. Malhotra, Hiroyuki Ode | 2014-09-09 |
| 8809160 | Methods for forming high-K crystalline films and related devices | Hanhong Chen, Pragati Kumar, Sandra G. Malhotra, Xiangxin Rui | 2014-08-19 |
| 8737036 | Titanium based high-K dielectric films | Hanhong Chen, Nobumichi Fuchigami, Imran Hashim, Pragati Kumar, Sandra G. Malhotra +3 more | 2014-05-27 |
| 8652927 | Integration of non-noble DRAM electrode | Sandra G. Malhotra, Hanhong Chen, Wim Deweerd, Hiroyuki Ode, Gerald Richardson | 2014-02-18 |
| 8647943 | Enhanced non-noble electrode layers for DRAM capacitor cell | Hanhong Chen, Wim Deweerd, Sandra G. Malhotra, Hiroyuki Ode | 2014-02-11 |
| 8581318 | Enhanced non-noble electrode layers for DRAM capacitor cell | Hanhong Chen, Wim Deweerd, Sandra G. Malhotra, Hiroyuki Ode | 2013-11-12 |
| 8574985 | Methods for depositing high-K dielectrics | Xiangxin Rui, Sunil Shanker, Sandra G. Malhotra, Imran Hashim | 2013-11-05 |
| 8563392 | Method of forming an ALD material | Sandra G. Malhotra, Wim Deweerd, Hiroyuki Ode | 2013-10-22 |
| 8551851 | Titanium-based high-K dielectric films | Hanhong Chen, Pragati Kumar, Sunil Shanker, Sandra G. Malhotra, Imran Hashim +3 more | 2013-10-08 |
| 8541828 | Methods for depositing high-K dielectrics | Imran Hashim, Sandra G. Malhotra, Xiangxin Rui, Sunil Shanker | 2013-09-24 |
| 8530348 | Integration of non-noble DRAM electrode | Sandra G. Malhotra, Hanhong Chen, Wim Deweerd, Hiroyuki Ode, Gerald Richardson | 2013-09-10 |
| 8530322 | Method of forming stacked metal oxide layers | Hanhong Chen, Pragati Kumar, Sandra G. Malhotra, Xiangxin Rui | 2013-09-10 |