Issued Patents All Time
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9607904 | Atomic layer deposition of HfAlC as a metal gate workfunction material in MOS devices | Albert S. Lee, Paul R. Besser, Kisik Choi, Edward Haywood, Hoon Kim | 2017-03-28 |
| 9362283 | Gate structures for transistor devices for CMOS applications and products | Zhendong Hong, Susie Tzeng, Amol Joshi, Ashish Bodke, Divya Pisharoty +6 more | 2016-06-07 |
| 9224644 | Method to control depth profiles of dopants using a remote plasma source | Sandip Niyogi, Amol Joshi, Chi-I Lang | 2015-12-29 |
| 9105497 | Methods of forming gate structures for transistor devices for CMOS applications | Zhendong Hong, Susie Tzeng, Amol Joshi, Ashish Bodke, Divya Pisharoty +6 more | 2015-08-11 |