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Using content type to select brightness in direct-lit backlight units |
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Gate structures for transistor devices for CMOS applications and products |
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Combinatorial screening of metallic diffusion barriers |
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Atomic layer deposition of metal oxides for memory applications |
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Methods of forming gate structures for transistor devices for CMOS applications |
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Method of forming an erbium silicide metal gate stack FinFET device via a physical vapor deposition nanolaminate approach |
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2015-06-16 |
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Atomic layer deposition of metal oxides for memory applications |
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Combinatorial processing using high deposition rate sputtering |
Hong Sheng Yang, Chi-I Lang |
2014-12-30 |
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Substrate processing including correction for deposition location |
Jeremy Cheng, Ho Yin Owen Fong, Dan Wang, Indranil De |
2014-11-11 |
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Circular transmission line methods compatible with combinatorial processing of semiconductors |
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2014-10-07 |
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Atomic layer deposition of metal oxides for memory applications |
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High productivity combinatorial oxide terracing and PVD/ALD metal deposition combined with lithography for gate work function extraction |
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High productivity combinatorial workflow for photoresist strip applications |
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2014-03-04 |