Issued Patents All Time
Showing 25 most recent of 51 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9399753 | Aqua regia and hydrogen peroxide HCL combination to remove Ni and NiPt residues | Anh Duong, Clemens Fitz | 2016-07-26 |
| 9362283 | Gate structures for transistor devices for CMOS applications and products | Zhendong Hong, Susie Tzeng, Amol Joshi, Ashish Bodke, Divya Pisharoty +6 more | 2016-06-07 |
| 9196475 | Methods for fabricating integrated circuits including fluorine incorporation | Bongki Lee, Paul R. Besser, Kevin Kashefi, Ashish Bodke, Ratsamee Limdulpaiboon +2 more | 2015-11-24 |
| 9105497 | Methods of forming gate structures for transistor devices for CMOS applications | Zhendong Hong, Susie Tzeng, Amol Joshi, Ashish Bodke, Divya Pisharoty +6 more | 2015-08-11 |
| 9059156 | Method of forming an erbium silicide metal gate stack FinFET device via a physical vapor deposition nanolaminate approach | Zhendong Hong, Ashish Bodke | 2015-06-16 |
| 8946015 | Aqua regia and hydrogen peroxide HCI combination to remove Ni and NiPt residues | Anh Duong, Clemens Fitz | 2015-02-03 |
| 8859431 | Process to remove Ni and Pt residues for NiPtSi application using chlorine gas | Anh Duong, John Foster, James Mavrinac, Usha Raghuram | 2014-10-14 |
| 8853081 | High dose ion-implanted photoresist removal using organic solvent and transition metal mixtures | Anh Duong, Sven Metzger | 2014-10-07 |
| 8854067 | Circular transmission line methods compatible with combinatorial processing of semiconductors | Amol Joshi, Charlene Chen, John Foster, Zhendong Hong, Bei Li +5 more | 2014-10-07 |
| 8809140 | Aqua regia and hydrogen peroxide HCl combination to remove Ni and NiPt residues | Anh Duong, Clemens Fitz | 2014-08-19 |
| 8784572 | Method for cleaning platinum residues on a semiconductor substrate | Anh Duong, Sean Barstow, Bei Li, James Mavrinac | 2014-07-22 |
| 8735302 | High productivity combinatorial oxide terracing and PVD/ALD metal deposition combined with lithography for gate work function extraction | Amol Joshi, John Foster, Zhendong Hong, Bei Li, Usha Raghuram | 2014-05-27 |
| 8697573 | Process to remove Ni and Pt residues for NiPtSi applications using aqua regia with microwave assisted heating | Anh Duong | 2014-04-15 |
| 8635727 | Variable-size bed | Johan Dahlin, Claes Lindh, Håkan Karlsson | 2014-01-28 |
| 8518765 | Aqua regia and hydrogen peroxide HCl combination to remove Ni and NiPt residues | Anh Duong, Clemens Fitz | 2013-08-27 |
| 8513117 | Process to remove Ni and Pt residues for NiPtSi applications | Anh Duong, Sean Barstow, Clemens Fitz, John Foster, Bei Li +1 more | 2013-08-20 |
| 8466058 | Process to remove Ni and Pt residues for NiPtSi applications using chlorine gas | Anh Duong, John Foster, James Mavrinac, Usha Raghuram | 2013-06-18 |
| 8409952 | Method of forming an electronic device including forming a charge storage element in a trench of a workpiece | Suketu Arun Parikh, Yun-Ju Sun, Shankar Sinha, Timothy Thurgate | 2013-04-02 |
| 7326317 | Lignocellulose product | Ulla Westermark | 2008-02-05 |
| 6984569 | Shallow trench isolation (STI) region with high-K liner and method of formation | Haihong Wang, Bin Yu, Zoran Krivokapic, Qi Xiang | 2006-01-10 |
| 6894355 | Semiconductor device with silicide source/drain and high-K dielectric | Bin Yu | 2005-05-17 |
| 6867130 | Enhanced silicidation of polysilicon gate electrodes | Simon S. Chan, William G. En, Mark W. Michael | 2005-03-15 |
| 6660578 | High-K dielectric having barrier layer for P-doped devices and method of fabrication | Qi Xiang, Haihong Wang, Bin Yu, Zoran Krivokapic | 2003-12-09 |
| 6657267 | Semiconductor device and fabrication technique using a high-K liner for spacer etch stop | Qi Xiang, Haihong Wang, Bin Yu | 2003-12-02 |
| 6657276 | Shallow trench isolation (STI) region with high-K liner and method of formation | Haihong Wang, Bin Yu, Zoran Krivokapic, Qi Xiang | 2003-12-02 |