| 11183509 |
Non-volatile memory with silicided bit line contacts |
Ching-Huang Lu, Hidehiko Shiraiwa, Lei Xue |
2021-11-23 |
|
| 10692877 |
Non-volatile memory with silicided bit line contacts |
Ching-Huang Lu, Hidehiko Shiraiwa, Lei Xue |
2020-06-23 |
|
| 10256137 |
Self-aligned trench isolation in integrated circuits |
Ching-Huang Lu, Lei Xue, Kenichi Ohtsuka, Rinji Sugino |
2019-04-09 |
$12,822,000 |
| 9831114 |
Self-aligned trench isolation in integrated circuits |
Ching-Huang Lu, Lei Xue, Kenichi Ohtsuka, Rinji Sugino |
2017-11-28 |
$8,308,000 |
| 9673206 |
Buried hard mask for embedded semiconductor device patterning |
Scott A. Bell, Angela T. Hui |
2017-06-06 |
$11,420,000 |
| 9666591 |
Non-volatile memory with silicided bit line contacts |
Ching-Huang Lu, Hidehiko Shiraiwa, Lei Xue |
2017-05-30 |
$11,481,000 |
| 9437470 |
Self-aligned trench isolation in integrated circuits |
Ching-Huang Lu, Lei Xue, Kenichi Ohtsuka, Rinji Sugino |
2016-09-06 |
$7,954,000 |
| 9431503 |
Integrating transistors with different poly-silicon heights on the same die |
Chuan Lin, Hidehiko Shiraiwa, Bradley Marc Davis, Lei Xue, Kenichi Ohtsuka +2 more |
2016-08-30 |
$6,776,000 |
| 9318498 |
Buried hard mask for embedded semiconductor device patterning |
Scott A. Bell, Angela T. Hui |
2016-04-19 |
$2,645,000 |
| 9252026 |
Buried trench isolation in integrated circuits |
Rinji Sugino, Lei Xue, Ching-Huang Lu |
2016-02-02 |
$2,750,000 |
| 9252154 |
Non-volatile memory with silicided bit line contacts |
Ching-Huang Lu, Hidehiko Shiraiwa, Lei Xue |
2016-02-02 |
$2,750,000 |
| 9185793 |
Multilayer electronic structure with through thickness coaxial structures |
Dror Hurwitz, Alex Huang |
2015-11-10 |
|
| 9161461 |
Multilayer electronic structure with stepped holes |
Dror Hurwitz, Alex Huang |
2015-10-13 |
|
| 9137905 |
Alignment between layers of multilayer electronic support structures |
Dror Hurwitz |
2015-09-15 |
|
| 8866213 |
Non-Volatile memory with silicided bit line contacts |
Ching-Huang Lu, Hidehiko Shiraiwa, Lei Xue |
2014-10-21 |
$3,990,000 |
| 8735960 |
High ultraviolet light absorbance silicon oxynitride film for improved flash memory device performance |
Minh Quoc Tran, Minh Van Ngo, Alexander H. Nickel, Sung Jin Kim, Ning Cheng |
2014-05-27 |
$3,831,000 |
| 8652907 |
Integrating transistors with different poly-silicon heights on the same die |
Chuan Lin, Hidehiko Shiraiwa, Bradley Marc Davis, Lei Xue, Kenichi Ohtsuka +2 more |
2014-02-18 |
$2,278,000 |
| 8617983 |
Local interconnect having increased misalignment tolerance |
— |
2013-12-31 |
$1,530,000 |
| 8598005 |
Method and manufacture for embedded flash to achieve high quality spacers for core and high voltage devices and low temperature spacers for high performance logic devices |
Hidehiko Shiraiwa, Chuan Lin, Lei Xue, Kenichi Ohtsuka, Angela T. Hui |
2013-12-03 |
$1,390,000 |
| 8314454 |
Local interconnect having increased misalignment tolerance |
— |
2012-11-20 |
$6,237,000 |
| 8283249 |
Local interconnect having increased misalignment tolerance |
— |
2012-10-09 |
$6,948,000 |
| 8236693 |
Methods of forming silicides of different thicknesses on different structures |
Wen Yu, Paul R. Besser, Bin Yang, Haijiang Yu |
2012-08-07 |
$3,769,000 |
| 8114736 |
Integrated circuit system with memory system |
Hidehiko Shiraiwa, Kuo-Tung Chang, Angela T. Hui |
2012-02-14 |
|
| 8102009 |
Integrated circuit eliminating source/drain junction spiking |
Paul R. Besser, Jeffrey P. Patton |
2012-01-24 |
$3,915,000 |
| 7879718 |
Local interconnect having increased misalignment tolerance |
— |
2011-02-01 |
$1,751,000 |
