| 12237387 |
Method of spacer formation with straight sidewall of memory cells |
Scott A. Bell, Shenqing Fang |
2025-02-25 |
|
| 11830942 |
Contacts for semiconductor devices |
Wenmei Li, Minh Van Ngo, Amol Joshi, Kuo-Tung Chang |
2023-11-28 |
|
| 10944000 |
Contacts for semiconductor devices |
Wenmei Li, Minh Van Ngo, Amol Joshi, Kuo-Tung Chang |
2021-03-09 |
|
| 10593688 |
Split-gate semiconductor device with L-shaped gate |
Scott A. Bell, Chun Chen, Lei Xue, Shenqing Fang |
2020-03-17 |
$58,440,000 |
| 10516044 |
Contacts for semiconductor devices |
Wenmei Li, Minh Van Ngo, Amol Joshi, Kuo-Tung Chang |
2019-12-24 |
$23,295,000 |
| 10020316 |
Split-gate semiconductor device with L-shaped gate |
Scott A. Bell, Chun Chen, Lei Xue, Shenqing Fang |
2018-07-10 |
$5,897,000 |
| 9673206 |
Buried hard mask for embedded semiconductor device patterning |
Scott A. Bell, Simon S. Chan |
2017-06-06 |
$11,420,000 |
| 9589805 |
Split-gate semiconductor device with L-shaped gate |
Scott A. Bell, Chun Chen, Lei Xue, Shenqing Fang |
2017-03-07 |
$3,144,000 |
| 9466496 |
Spacer formation with straight sidewall |
Scott A. Bell, Shenqing Fang |
2016-10-11 |
$5,640,000 |
| 9455352 |
HTO offset for long leffective, better device performance |
Ning Cheng, Huaqiang Wu, Hiro Kinoshita, Jihwan P. Choi |
2016-09-27 |
$10,838,000 |
| 9431503 |
Integrating transistors with different poly-silicon heights on the same die |
Chuan Lin, Hidehiko Shiraiwa, Bradley Marc Davis, Lei Xue, Simon S. Chan +2 more |
2016-08-30 |
$6,776,000 |
| 9318498 |
Buried hard mask for embedded semiconductor device patterning |
Scott A. Bell, Simon S. Chan |
2016-04-19 |
$2,645,000 |
| 9245895 |
Oro and orpro with bit line trench to suppress transport program disturb |
Ning Cheng, Kuo-Tung Chang, Hiro Kinoshita, Chih-Yuh Yang, Lei Xue +3 more |
2016-01-26 |
$4,549,000 |
| 8975185 |
Forming charge trap separation in a flash memory semiconductor device |
— |
2015-03-10 |
$27,014,000 |
| 8836012 |
Spacer design to prevent trapped electrons |
— |
2014-09-16 |
$3,415,000 |
| 8815727 |
Integrated circuit with metal and semi-conducting gate |
Mark S. Chang, Kuo-Tung Chang, Scott A. Bell |
2014-08-26 |
|
| 8790530 |
Planar cell ONO cut using in-situ polymer deposition and etch |
Gang Xue |
2014-07-29 |
$1,802,000 |
| 8759894 |
System and method for reducing cross-coupling noise between charge storage elements in a semiconductor device |
Yider Wu, Hiroyuki Ogawa, Unsoon Kim |
2014-06-24 |
|
| 8658496 |
Etch stop layer for memory cell reliability improvement |
Hiroyuki Kinoshita, Hsiao-Han Thio, Kuo-Tung Chang, Minh Van Ngo, Hiroyuki Ogawa |
2014-02-25 |
|
| 8653581 |
HTO offset for long Leffective, better device performance |
Ning Cheng, Huaqiang Wu, Hiro Kinoshita, Jihwan P. Choi |
2014-02-18 |
$2,278,000 |
| 8652907 |
Integrating transistors with different poly-silicon heights on the same die |
Chuan Lin, Hidehiko Shiraiwa, Bradley Marc Davis, Lei Xue, Simon S. Chan +2 more |
2014-02-18 |
$2,278,000 |
| 8614475 |
Void free interlayer dielectric |
Minh Van Ngo, Hirokazu Tokuno, Wenmei Li, Hsiao-Han Thio |
2013-12-24 |
|
| 8598005 |
Method and manufacture for embedded flash to achieve high quality spacers for core and high voltage devices and low temperature spacers for high performance logic devices |
Simon S. Chan, Hidehiko Shiraiwa, Chuan Lin, Lei Xue, Kenichi Ohtsuka |
2013-12-03 |
$1,390,000 |
| 8598645 |
System and method for improving mesa width in a semiconductor device |
Unsoon Kim, Yider Wu, Kuo-Tung Chang, Hiroyuki Kinoshita |
2013-12-03 |
|
| 8564041 |
Contacts for semiconductor devices |
Wenmei Li, Minh Van Ngo, Amol Joshi, Kuo-Tung Chang |
2013-10-22 |
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