| 8815727 |
Integrated circuit with metal and semi-conducting gate |
Angela T. Hui, Kuo-Tung Chang, Scott A. Bell |
2014-08-26 |
|
| 8507969 |
Method and system for providing contact to a first polysilicon layer in a flash memory device |
Hao Fang, King Wai Kelwin Ko |
2013-08-13 |
$1,630,000 |
| 8445372 |
Selective silicide formation using resist etch back |
Kyunghoon Min, Angela T. Hui, Hiroyuki Kinoshita, Ning Cheng |
2013-05-21 |
$1,207,000 |
| 8329530 |
Method and system for providing contact to a first polysilicon layer in a flash memory device |
Hao Fang, King Wai Kelwin Ko |
2012-12-11 |
$1,154,000 |
| 8283718 |
Integrated circuit system with metal and semi-conducting gate |
Angela T. Hui, Kuo-Tung Chang, Scott A. Bell |
2012-10-09 |
|
| 8183619 |
Method and system for providing contact to a first polysilicon layer in a flash memory device |
Hao Fang, King Wai Kelwin Ko |
2012-05-22 |
|
| 8035153 |
Self-aligned patterning method by using non-conformal film and etch for flash memory and other semiconductor applications |
Shenqing Fang, Jihwan P. Choi, Calvin T. Gabriel, Fei Wang, Angela T. Hui +4 more |
2011-10-11 |
$2,963,000 |
| 7732276 |
Self-aligned patterning method by using non-conformal film and etch back for flash memory and other semiconductor applications |
Shenqing Fang, Jihwan P. Choi, Calvin T. Gabriel, Fei Wang, Angela T. Hui +4 more |
2010-06-08 |
|
| 7691751 |
Selective silicide formation using resist etchback |
Kyunghoon Min, Angela T. Hui, Hiroyuki Kinoshita, Ning Cheng |
2010-04-06 |
|
| 7622389 |
Selective contact formation using masking and resist patterning techniques |
Kyunghoon Min, Ning Cheng, Brian Osborn, Kevin Song, Fei Wang +3 more |
2009-11-24 |
|
| 7439141 |
Shallow trench isolation approach for improved STI corner rounding |
Unsoon Kim, Yu Sun, Hiroyuki Kinoshita, Kuo-Tung Chang, Harpreet Sachar |
2008-10-21 |
$1,390,000 |
| 7374654 |
Method of making an organic memory cell |
Sergey Lopatin, Ramkumar Subramanian |
2008-05-20 |
$3,104,000 |
| 7361588 |
Etch process for CD reduction of arc material |
Phillip Jones, Scott A. Bell |
2008-04-22 |
$9,226,000 |
| 7256141 |
Interface layer between dual polycrystalline silicon layers |
Mark T. Ramsbey, Weidong Qian, Eric N. Paton |
2007-08-14 |
|
| 7015504 |
Sidewall formation for high density polymer memory element array |
Christopher F. Lyons, Sergey Lopatin, Ramkumar Subramanian, Patrick K. Cheung, Minh Van Ngo +1 more |
2006-03-21 |
$13,217,000 |
| 6979619 |
Flash memory device and a method of fabrication thereof |
Hao Fang, Yue-Song He, Kent Kuohua Chang |
2005-12-27 |
$8,074,000 |
| 6900488 |
Multi-cell organic memory element and methods of operating and fabricating |
Sergey Lopatin, Minh Van Ngo, Patrick K. Cheung |
2005-05-31 |
$6,268,000 |
| 6878961 |
Photosensitive polymeric memory elements |
Christopher F. Lyons, Ramkumar Subramanian |
2005-04-12 |
$6,806,000 |
| 6864556 |
CVD organic polymer film for advanced gate patterning |
Lu You, Marina V. Plat, Chih-Yuh Yang, Scott A. Bell, Richard J. Huang +2 more |
2005-03-08 |
$6,020,000 |
| 6836398 |
System and method of forming a passive layer by a CMP process |
Ramkumar Subramanian, Jane V. Oglesby, Minh Van Ngo, Sergey Lopatin, Angela T. Hui +3 more |
2004-12-28 |
$7,308,000 |
| 6825060 |
Photosensitive polymeric memory elements |
Christopher F. Lyons, Ramkumar Subramanian |
2004-11-30 |
$7,368,000 |
| 6815292 |
Flash memory having improved core field isolation in select gate regions |
Hao Fang |
2004-11-09 |
$3,568,000 |
| 6812077 |
Method for patterning narrow gate lines |
Darin A. Chan, Douglas J. Bonser |
2004-11-02 |
$2,431,000 |
| 6806165 |
Isolation trench fill process |
Dawn Hopper, Minh Van Ngo |
2004-10-19 |
$2,591,000 |
| 6797552 |
Method for defect reduction and enhanced control over critical dimensions and profiles in semiconductor devices |
Douglas J. Bonser, Marina V. Plat, Chih-Yuh Yang, Scott A. Bell, Srikanteswara Dakshina-Murthy |
2004-09-28 |
$1,915,000 |
