Issued Patents All Time
Showing 1–25 of 79 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8629535 | Mask for forming integrated circuit | Richard J. Huang, Scott A. Bell, Philip A. Fisher, Richard Nguyen, Cyrus E. Tabery +1 more | 2014-01-14 |
| 8547521 | Systems and methods that control liquid temperature in immersion lithography to maintain temperature gradient to reduce turbulence | Bhanwar Singh, Ramkumar Subramanian | 2013-10-01 |
| 8007631 | System and method for imprint lithography to facilitate dual damascene integration with two imprint acts | Bhanwar Singh, Ramkumar Subramanian | 2011-08-30 |
| 7915160 | Methods for forming small contacts | Cyrus E. Tabery, Chih-Yuh Yang, Bin Yu | 2011-03-29 |
| 7795046 | Method and apparatus for monitoring endcap pullback | Chew Hoe Ang | 2010-09-14 |
| 7737021 | Resist trim process to define small openings in dielectric layers | Paul R. Besser, Jonathan B. Smith, Eric M. Apelgren, Christian Zistl, Jeremy I. Martin +2 more | 2010-06-15 |
| 7709373 | System and method for imprint lithography to facilitate dual damascene integration in a single imprint act | Bhanwar Singh, Khoi A. Phan | 2010-05-04 |
| 7604903 | Mask having sidewall absorbers to enable the printing of finer features in nanoprint lithography (1XMASK) | Bhanwar Singh, Khoi A. Phan, Bharath Rangarajan, Ramkumar Subramanian | 2009-10-20 |
| 7521304 | Method for forming integrated circuit | Richard J. Huang, Scott A. Bell, Philip A. Fisher, Richard Nguyen, Cyrus E. Tabery +1 more | 2009-04-21 |
| 7449348 | Feedback control of imprint mask feature profile using scatterometry and spacer etchback | Bhanwar Singh, Ramkumar Subramanian, Khoi A. Phan | 2008-11-11 |
| 7432558 | Formation of semiconductor devices to achieve <100> channel orientation | Shibly S. Ahmed, Judy Xilin An, Cyrus E. Tabery, Bin Yu | 2008-10-07 |
| 7405032 | Combination of non-lithographic shrink techniques and trim process for gate formation and line-edge roughness reduction | Gilles Amblard, Bhanwar Singh | 2008-07-29 |
| 7384569 | Imprint lithography mask trimming for imprint mask using etch | Bhanwar Singh, Ramkumar Subramanian | 2008-06-10 |
| 7386162 | Post fabrication CD modification on imprint lithography mask | Bhanwar Singh, Ramkumar Subramanian | 2008-06-10 |
| 7381278 | Using supercritical fluids to clean lenses and monitor defects | Ramkumar Subramanian, Bhanwar Singh, Khoi A. Phan | 2008-06-03 |
| 7376259 | Topography compensation of imprint lithography patterning | Bhanwar Singh, Ramkumar Subramanian | 2008-05-20 |
| 7279386 | Method for forming a semiconductor arrangement with gate sidewall spacers of specific dimensions | Mark Kelling, Douglas J. Bonser, Asuka Nomura | 2007-10-09 |
| 7268066 | Method for semiconductor gate line dimension reduction | Douglas J. Bonser, Marina V. Plat, Chih-Yuh Yang, Scott A. Bell, Philip A. Fisher +1 more | 2007-09-11 |
| 7235474 | System and method for imprint lithography to facilitate dual damascene integration with two imprint acts | Bhanwar Singh, Ramkumar Subramanian | 2007-06-26 |
| 7223698 | Method of forming a semiconductor arrangement with reduced field-to active step height | Douglas J. Bonser, Mark Kelling, John G. Pellerin, Johannes Groschopf, Edward Asuka Nomura | 2007-05-29 |
| 7196372 | Flash memory device | Bin Yu, Ming-Ren Lin, Zoran Krivokapic | 2007-03-27 |
| 7186650 | Control of bottom dimension of tapered contact via variation(s) of etch process | — | 2007-03-06 |
| 7183223 | Methods for forming small contacts | Cyrus E. Tabery, Chih-Yuh Yang, Bin Yu | 2007-02-27 |
| 7183152 | Epitaxially grown fin for FinFET | Chih-Yuh Yang, Bin Yu | 2007-02-27 |
| 7179692 | Method of manufacturing a semiconductor device having a fin structure | Bin Yu, Shibly S. Ahmed, Judy Xilin An, Zoran Krivokapic, Haihong Wang | 2007-02-20 |