Issued Patents All Time
Showing 26–50 of 79 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7158896 | Real time immersion medium control using scatterometry | Bhanwar Singh, Khoi A. Phan, Ramkumar Subramanian, Bharath Rangarajan, Iraj Emami | 2007-01-02 |
| 7156925 | Using supercritical fluids to clean lenses and monitor defects | Ramkumar Subramanian, Bhanwar Singh, Khoi A. Phan | 2007-01-02 |
| 7148142 | System and method for imprint lithography to facilitate dual damascene integration in a single imprint act | Bhanwar Singh, Khoi A. Phan | 2006-12-12 |
| 7144785 | Method of forming isolation trench with spacer formation | Douglas J. Bonser, Mark Kelling, Asuka Nomura | 2006-12-05 |
| 7122455 | Patterning with rigid organic under-layer | Christopher F. Lyons, Marina V. Plat, Scott A. Bell, Cyrus E. Tabery | 2006-10-17 |
| 7109101 | Capping layer for reducing amorphous carbon contamination of photoresist in semiconductor device manufacture; and process for making same | Marilyn I. Wright, Kurt H. Junker, Kyle Patterson | 2006-09-19 |
| 7105399 | Selective epitaxial growth for tunable channel thickness | Douglas J. Bonser, Hans Van Meer, David E. Brown | 2006-09-12 |
| 7091106 | Method of reducing STI divot formation during semiconductor device fabrication | Douglas J. Bonser, Johannes Groschopf, John G. Pellerin, Jon D. Cheek | 2006-08-15 |
| 7084071 | Use of multilayer amorphous carbon ARC stack to eliminate line warpage phenomenon | Scott A. Bell, Richard J. Huang, Richard Nguyen, Cyrus E. Tabery | 2006-08-01 |
| 7065427 | Optical monitoring and control of two layers of liquid immersion media | Bhanwar Singh, Ramkumar Subramanian, Bharath Rangarajan, Khoi A. Phan | 2006-06-20 |
| 7052921 | System and method using in situ scatterometry to detect photoresist pattern integrity during the photolithography process | Marina V. Plat, Bhanwar Singh, Calvin T. Gabriel, Christopher F. Lyons, Scott A. Bell +1 more | 2006-05-30 |
| 7029958 | Self aligned damascene gate | Cyrus E. Tabery, Shibly S. Ahmed, Matthew S. Buynoski, Zoran Krivokapic, Haihong Wang +2 more | 2006-04-18 |
| 7022596 | Method for forming rectangular-shaped spacers for semiconductor devices | Huicai Zhong | 2006-04-04 |
| 7005386 | Method for reducing resist height erosion in a gate etch process | Scott A. Bell, Chih-Yuh Yang, Ashok M. Khathuria | 2006-02-28 |
| 6989332 | Ion implantation to modulate amorphous carbon stress | Scott A. Bell, Christopher F. Lyons | 2006-01-24 |
| 6979651 | Method for forming alignment features and back-side contacts with fewer lithography and etch steps | Kay Hellig, Douglas J. Bonser | 2005-12-27 |
| 6960804 | Semiconductor device having a gate structure surrounding a fin | Chih-Yuh Yang, Shibly S. Ahmed, Judy Xilin An, Bin Yu | 2005-11-01 |
| 6921963 | Narrow fin FinFET | Zoran Krivokapic, Judy Xilin An, Haihong Wang, Bin Yu | 2005-07-26 |
| 6900139 | Method for photoresist trim endpoint detection | Douglas J. Bonser, Karen Turnquest | 2005-05-31 |
| 6897527 | Strained channel FinFET | Judy Xilin An, Zoran Krivokapic, Haihong Wang, Bin Yu | 2005-05-24 |
| 6884733 | Use of amorphous carbon hard mask for gate patterning to eliminate requirement of poly re-oxidation | Scott A. Bell, David E. Brown, Philip A. Fisher | 2005-04-26 |
| 6875664 | Formation of amorphous carbon ARC stack having graded transition between amorphous carbon and ARC material | Richard J. Huang, Philip A. Fisher, Cyrus E. Tabery, Lu You | 2005-04-05 |
| 6864164 | Finfet gate formation using reverse trim of dummy gate | Zoran Krivokapic, Cyrus E. Tabery | 2005-03-08 |
| 6855627 | Method of using amorphous carbon to prevent resist poisoning | Scott A. Bell, Richard J. Huang, Richard Nguyen, Cyrus E. Tabery | 2005-02-15 |
| 6855582 | FinFET gate formation using reverse trim and oxide polish | Cyrus E. Tabery | 2005-02-15 |