| 11014622 |
Retractable cover systems |
— |
2021-05-25 |
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Semiconductor device having an organic anti-reflective coating (ARC) and method therefor |
Douglas M. Reber, Mark D. Hall, Kurt H. Junker, Tab A. Stephens, Edward K. Theiss +2 more |
2011-10-18 |
| 7935547 |
Method of patterning a layer using a pellicle |
Kevin Lucas, Sergei Postnikov |
2011-05-03 |
| 7615318 |
Printing of design features using alternating PSM technology with double mask exposure strategy |
Yves Rody, Christophe Couderc, Corinne Miramond-Collet |
2009-11-10 |
| 7199429 |
Semiconductor device having an organic anti-reflective coating (ARC) and method therefor |
Douglas M. Reber, Mark D. Hall, Kurt H. Junker, Tab A. Stephens, Edward K. Theiss +2 more |
2007-04-03 |
| 7109101 |
Capping layer for reducing amorphous carbon contamination of photoresist in semiconductor device manufacture; and process for making same |
Marilyn I. Wright, Srikanteswara Dakshina-Murthy, Kurt H. Junker |
2006-09-19 |
| 6972255 |
Semiconductor device having an organic anti-reflective coating (ARC) and method therefor |
Douglas M. Reber, Mark D. Hall, Kurt H. Junker, Tab A. Stephens, Edward K. Theiss +2 more |
2005-12-06 |