| 8039389 |
Semiconductor device having an organic anti-reflective coating (ARC) and method therefor |
Douglas M. Reber, Mark D. Hall, Kurt H. Junker, Kyle Patterson, Tab A. Stephens +2 more |
2011-10-18 |
| 7861195 |
Process for design of semiconductor circuits |
Darin A. Chan, Yi Zou, Yuansheng Ma, Mark W. Michael |
2010-12-28 |
| 7262864 |
Method and apparatus for determining grid dimensions using scatterometry |
Richard J. Markle, Kevin R. Lensing, J. Broc Stirton |
2007-08-28 |
| 7199429 |
Semiconductor device having an organic anti-reflective coating (ARC) and method therefor |
Douglas M. Reber, Mark D. Hall, Kurt H. Junker, Kyle Patterson, Tab A. Stephens +2 more |
2007-04-03 |
| 7109101 |
Capping layer for reducing amorphous carbon contamination of photoresist in semiconductor device manufacture; and process for making same |
Srikanteswara Dakshina-Murthy, Kurt H. Junker, Kyle Patterson |
2006-09-19 |
| 6972255 |
Semiconductor device having an organic anti-reflective coating (ARC) and method therefor |
Douglas M. Reber, Mark D. Hall, Kurt H. Junker, Kyle Patterson, Tab A. Stephens +2 more |
2005-12-06 |
| 6913958 |
Method for patterning a feature using a trimmed hardmask |
Marina V. Plat, Chih-Yuh Yang, Douglas J. Bonser |
2005-07-05 |
| 6900002 |
Antireflective bi-layer hardmask including a densified amorphous carbon layer |
Marina V. Plat, Lu You, Scott A. Bell |
2005-05-31 |
| 6893967 |
L-shaped spacer incorporating or patterned using amorphous carbon or CVD organic materials |
Douglas J. Bonser, Lu You, Kay Hellig |
2005-05-17 |
| 6864556 |
CVD organic polymer film for advanced gate patterning |
Lu You, Marina V. Plat, Chih-Yuh Yang, Scott A. Bell, Richard J. Huang +2 more |
2005-03-08 |
| 6804014 |
Method and apparatus for determining contact opening dimensions using scatterometry |
Richard J. Markle, Kevin R. Lensing, J. Broc Stirton |
2004-10-12 |
| 6773939 |
Method and apparatus for determining critical dimension variation in a line structure |
— |
2004-08-10 |
| 6774998 |
Method and apparatus for identifying misregistration in a complimentary phase shift mask process |
Kevin R. Lensing, James Broc Stirton |
2004-08-10 |
| 6764947 |
Method for reducing gate line deformation and reducing gate line widths in semiconductor devices |
Darin A. Chan, Douglas J. Bonser, Marina V. Plat, Chih-Yuh Yang, Lu You +2 more |
2004-07-20 |
| 6764949 |
Method for reducing pattern deformation and photoresist poisoning in semiconductor device fabrication |
Douglas J. Bonser, Marina V. Plat, Chih-Yuh Yang, Scott A. Bell, Darin A. Chan +6 more |
2004-07-20 |
| 6766215 |
Method and apparatus for detecting necking over field/active transitions |
Kevin R. Lensing |
2004-07-20 |
| 6716646 |
Method and apparatus for performing overlay measurements using scatterometry |
Kevin R. Lensing, James Broc Stirton, Richard J. Markle |
2004-04-06 |
| 6697153 |
Method and apparatus for analyzing line structures |
James Broc Stirton |
2004-02-24 |
| 6657716 |
Method and apparatus for detecting necking over field/active transitions |
Kevin R. Lensing |
2003-12-02 |
| 6650423 |
Method and apparatus for determining column dimensions using scatterometry |
Richard J. Markle, Kevin R. Lensing, J. Broc Stirton |
2003-11-18 |
| 6509201 |
Method and apparatus for monitoring wafer stress |
— |
2003-01-21 |
| 6479309 |
Method and apparatus for determining process layer conformality |
— |
2002-11-12 |
| 6458610 |
Method and apparatus for optical film stack fault detection |
Kevin R. Lensing, James Broc Stirton |
2002-10-01 |
| 6426262 |
Method of analyzing the effects of shadowing of angled halo implants |
Mark B. Fuselier, Jon D. Cheek, Frederick N. Hause |
2002-07-30 |
| 6261936 |
Poly gate CD passivation for metrology control |
Derick J. Wristers, Jon D. Cheek |
2001-07-17 |
