Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7962459 | Method of providing context specific recipes in a semiconductor facility by defining product categories | Ronald Grünz, Heiko Wagner, Uwe Liebold | 2011-06-14 |
| 7256113 | System for forming a semiconductor device and method thereof | Phillip E. Crabtree, Massud Aminpur | 2007-08-14 |
| 7151055 | Technique for forming a gate electrode by using a hard mask | Massud Aminpur | 2006-12-19 |
| 7130762 | Method and system for handling substrates in a production line including a cluster tool and a metrology tool | Peter Goerigk, Uwe Liebold, Ronald Gruenz, Karl-Heinz Fandrey | 2006-10-31 |
| 6979651 | Method for forming alignment features and back-side contacts with fewer lithography and etch steps | Douglas J. Bonser, Srikanteswara Dakshina-Murthy | 2005-12-27 |
| 6902870 | Patterning of dielectric with added layers of materials aside from photoresist for enhanced pattern transfer | Massud Aminpur | 2005-06-07 |
| 6893967 | L-shaped spacer incorporating or patterned using amorphous carbon or CVD organic materials | Marilyn I. Wright, Douglas J. Bonser, Lu You | 2005-05-17 |
| 6881616 | System for forming a semiconductor device and method thereof including implanting through a L shaped spacer to form source and drain regions | Douglas J. Bonser, Wen-Jie Qi | 2005-04-19 |
| 6828240 | Method of manufacturing multi-level contacts by sizing of contact sizes in integrated circuits | Massud Aminpur | 2004-12-07 |
| 6703297 | Method of removing inorganic gate antireflective coating after spacer formation | — | 2004-03-09 |
| 6699641 | Photosensitive bottom anti-reflective coating | Massud Aminpur | 2004-03-02 |
| 6696334 | Method for formation of a differential offset spacer | Srikanteswara Dakshina-Murthy, Christoph Schwan | 2004-02-24 |
| 6673635 | Method for alignment mark formation for a shallow trench isolation process | Douglas J. Bonser, Srikanteswara Dakshina-Murthy | 2004-01-06 |