Issued Patents All Time
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8715910 | Method for exposing an area on a substrate to a beam and photolithographic system | Vlad Temchenko, Chinteong Lim, Jens Schneider | 2014-05-06 |
| 8370773 | Method and apparatus for designing an integrated circuit using inverse lithography technology | Kevin Lucas, Robert Boone | 2013-02-05 |
| 7615318 | Printing of design features using alternating PSM technology with double mask exposure strategy | Kyle Patterson, Christophe Couderc, Corinne Miramond-Collet | 2009-11-10 |