| 8661393 |
Method for analyzing placement context sensitivity of standard cells |
Puneet Sharma, Matthew A. Thompson |
2014-02-25 |
| 8370773 |
Method and apparatus for designing an integrated circuit using inverse lithography technology |
Kevin Lucas, Yves Rody |
2013-02-05 |
| 8175737 |
Method and apparatus for designing and integrated circuit |
Kevin Lucas, James E. Vasek, William L. Wilkinson, Christophe Couderc |
2012-05-08 |
| 7962868 |
Method for forming a semiconductor device using optical proximity correction for the optical lithography |
Kevin Lucas, Karl Wimmer, Christian Gardin |
2011-06-14 |
| 7284231 |
Layout modification using multilayer-based constraints |
Kevin Lucas, Mehul D. Shroff, Kirk Strozewski, Chi-Min Yuan, Jason T. Porter |
2007-10-16 |
| 6818362 |
Photolithography reticle design |
Kevin Lucas, Lloyd C. Litt, Wei E. Wu |
2004-11-16 |
| 6593226 |
Method for adding features to a design layout and process for designing a mask |
Edward O. Travis, Aykut Dengi, Sejal Chheda, Tat-Kwan Yu, Mark S. Roberton +2 more |
2003-07-15 |
