Issued Patents All Time
Showing 25 most recent of 147 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8748800 | Charge storage device for detecting alpha particles | Timothy Z. Hossain, Patrick Mark Clopton, Christopher Foster, Clayton Fulwood, Greg Alan Goodwin +1 more | 2014-06-10 |
| 8436289 | System and method for detecting particles with a semiconductor device | Timothy Z. Hossain, Patrick Mark Clopton, Christopher Foster, Clayton Fullwood, Greg Alan Goodwin +1 more | 2013-05-07 |
| 7608855 | Polymer dielectrics for memory element array interconnect | — | 2009-10-27 |
| 7427457 | Methods for designing grating structures for use in situ scatterometry to detect photoresist defects | Marina V. Plat, Calvin T. Gabriel, Anna M. Minvielle | 2008-09-23 |
| 7268066 | Method for semiconductor gate line dimension reduction | Douglas J. Bonser, Marina V. Plat, Chih-Yuh Yang, Scott A. Bell, Srikanteswara Dakshina-Murthy +1 more | 2007-09-11 |
| 7169711 | Method of using carbon spacers for critical dimension (CD) reduction | Philip A. Fisher, Richard J. Huang, Cyrus E. Tabery | 2007-01-30 |
| 7125652 | Immersion lithographic process using a conforming immersion medium | Carl P. Babcock, Jongwook Kye | 2006-10-24 |
| 7122455 | Patterning with rigid organic under-layer | Marina V. Plat, Srikanteswara Dakshina-Murthy, Scott A. Bell, Cyrus E. Tabery | 2006-10-17 |
| 7115440 | SO2 treatment of oxidized CuO for copper sulfide formation of memory element growth | Ramkumar Subramanian, Sergey Lopatin, James J. Xie, Angela T. Hui | 2006-10-03 |
| 7112489 | Negative resist or dry develop process for forming middle of line implant layer | Anna M. Minvielle, Marina V. Plat | 2006-09-26 |
| 7056804 | Shallow trench isolation polish stop layer for reduced topography | Ramkumar Subramanian | 2006-06-06 |
| 7052921 | System and method using in situ scatterometry to detect photoresist pattern integrity during the photolithography process | Marina V. Plat, Bhanwar Singh, Calvin T. Gabriel, Scott A. Bell, Ramkumar Subramanian +1 more | 2006-05-30 |
| 7018922 | Patterning for elongated VSS contact flash memory | Hung-Eil Kim, Anna M. Minvielle, Marina V. Plat, Ramkumar Subramanian | 2006-03-28 |
| 7015504 | Sidewall formation for high density polymer memory element array | Mark S. Chang, Sergey Lopatin, Ramkumar Subramanian, Patrick K. Cheung, Minh Van Ngo +1 more | 2006-03-21 |
| 7011762 | Metal bridging monitor for etch and CMP endpoint detection | Ramkumar Subramanian, Steven C. Avanzino | 2006-03-14 |
| 7008832 | Damascene process for a T-shaped gate electrode | Ramkumar Subramanian, Marina V. Plat, Bhanwar Singh | 2006-03-07 |
| 6989332 | Ion implantation to modulate amorphous carbon stress | Scott A. Bell, Srikanteswara Dakshina-Murthy | 2006-01-24 |
| 6982043 | Scatterometry with grating to observe resist removal rate during etch | Ramkumar Subramanian, Bharath Rangarajan, Catherine B. Labelle, Bhanwar Singh | 2006-01-03 |
| 6972576 | Electrical critical dimension measurement and defect detection for reticle fabrication | Khoi A. Phan, Cyrus E. Tabery, Bhanwar Singh | 2005-12-06 |
| 6955939 | Memory element formation with photosensitive polymer dielectric | Terence Tong, Patrick K. Cheung | 2005-10-18 |
| 6906777 | Pellicle for a lithographic lens | Jongwook Kye, Carl P. Babcock | 2005-06-14 |
| 6900124 | Patterning for elliptical Vss contact on flash memory | Hung-Eil Kim, Anna M. Minvielle, Marina V. Plat, Ramkumar Subramanian | 2005-05-31 |
| 6878961 | Photosensitive polymeric memory elements | Ramkumar Subramanian, Mark S. Chang | 2005-04-12 |
| 6869888 | E-beam flood exposure of spin-on material to eliminate voids in vias | Marina V. Plat, Ramkumar Subramanian, Bhanwar Singh | 2005-03-22 |
| 6869734 | EUV reflective mask having a carbon film and a method of making such a mask | Cyrus E. Tabery, Richard J. Huang | 2005-03-22 |