Issued Patents All Time
Showing 26–50 of 147 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6864024 | Real-time control of chemically-amplified resist processing on wafer | Bharath Rangarajan | 2005-03-08 |
| 6864556 | CVD organic polymer film for advanced gate patterning | Lu You, Marina V. Plat, Chih-Yuh Yang, Scott A. Bell, Richard J. Huang +2 more | 2005-03-08 |
| 6852455 | Amorphous carbon absorber/shifter film for attenuated phase shift mask | Cyrus E. Tabery | 2005-02-08 |
| 6849530 | Method for semiconductor gate line dimension reduction | Douglas J. Bonser, Marina V. Plat, Chih-Yuh Yang, Scott A. Bell, Srikanteswara Dakshina-Murthy +1 more | 2005-02-01 |
| 6836398 | System and method of forming a passive layer by a CMP process | Ramkumar Subramanian, Jane V. Oglesby, Minh Van Ngo, Mark S. Chang, Sergey Lopatin +3 more | 2004-12-28 |
| 6829040 | Lithography contrast enhancement technique by varying focus with wavelength modulation | Jongwook Kye, Ivan Lalovic, Ramkumar Subramanian | 2004-12-07 |
| 6825114 | Selective stress-inducing implant and resulting pattern distortion in amorphous carbon patterning | Philip A. Fisher, Srikanteswara Dakshina-Murthy | 2004-11-30 |
| 6825060 | Photosensitive polymeric memory elements | Ramkumar Subramanian, Mark S. Chang | 2004-11-30 |
| 6808591 | Model based metal overetch control | Khoi A. Phan, Bharath Rangarajan, Steven C. Avanzino, Ramkumar Subramanian, Bhanwar Singh +1 more | 2004-10-26 |
| 6803267 | Silicon containing material for patterning polymeric memory element | Ramkumar Subramanian, Matthew S. Buynoski, Patrick K. Cheung, Angela T. Hui, Ashok M. Khathuria +5 more | 2004-10-12 |
| 6790790 | High modulus filler for low k materials | Bharath Rangarajan | 2004-09-14 |
| 6787458 | Polymer memory device formed in via opening | Nicholas H. Tripsas, Matthew S. Buynoski, Suzette K. Pangrle, Uzodinma Okoroanyanwu, Angela T. Hui +7 more | 2004-09-07 |
| 6773998 | Modified film stack and patterning strategy for stress compensation and prevention of pattern distortion in amorphous carbon gate patterning | Philip A. Fisher, Marina V. Plat, Chih-Yuh Yang, Scott A. Bell, Douglas J. Bonser +2 more | 2004-08-10 |
| 6773954 | Methods of forming passive layers in organic memory cells | Ramkumar Subramanian, Jane V. Oglesby, Sergey Lopatin, Mark S. Chang, James J. Xie +1 more | 2004-08-10 |
| 6771356 | Scatterometry of grating structures to monitor wafer stress | Bhanwar Singh, Steven C. Avanzino, Khoi A. Phan, Bharath Rangarajan, Ramkumar Subramanian +1 more | 2004-08-03 |
| 6764949 | Method for reducing pattern deformation and photoresist poisoning in semiconductor device fabrication | Douglas J. Bonser, Marina V. Plat, Chih-Yuh Yang, Scott A. Bell, Darin A. Chan +6 more | 2004-07-20 |
| 6753266 | Method of enhancing gate patterning properties with reflective hard mask | Todd P. Lukanc, Scott A. Bell, Marina V. Plat, Ramkumar Subramanian | 2004-06-22 |
| 6740566 | Ultra-thin resist shallow trench process using high selectivity nitride etch | Scott A. Bell, Harry J. Levinson, Khanh B. Nguyen, Fei Wang, Chih-Yuh Yang | 2004-05-25 |
| 6737222 | Dual damascene process utilizing a bi-layer imaging layer | Ramkumar Subramanian, Marina V. Plat, Scott A. Bell | 2004-05-18 |
| 6689541 | Process for forming a photoresist mask | Scott A. Bell, Todd P. Lukanc, Marina V. Plat, Ramkumar Subramanian | 2004-02-10 |
| 6686270 | Dual damascene trench depth monitoring | Ramkumar Subramanian | 2004-02-03 |
| 6684172 | Sensor to predict void free films using various grating structures and characterize fill performance | Ramkumar Subramanian, Steven C. Avanzino, Khoi A. Phan, Bharath Rangarajan, Bhanwar Singh +1 more | 2004-01-27 |
| 6660645 | Process for etching an organic dielectric using a silyated photoresist mask | Scott A. Bell, Todd P. Lukanc, Marina V. Plat, Ramkumar Subramanian | 2003-12-09 |
| 6656763 | Spin on polymers for organic memory devices | Jane V. Oglesby, Ramkumar Subramanian, Angela T. Hui, Minh Van Ngo, Suzette K. Pangrle | 2003-12-02 |
| 6654659 | Quartz crystal monitor wafer for lithography and etch process monitoring | Cyrus E. Tabery | 2003-11-25 |