Issued Patents All Time
Showing 25 most recent of 190 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12038189 | Optimization engine for energy sustainability | NIKITA KATYAL, Sourav Das, JAY GAYNOR, Matthew Johnson | 2024-07-16 |
| 11714944 | Optimization of physical cell placement for integrated circuits | Vito Dai, Edward Kah Ching Teoh, Ji Xu | 2023-08-01 |
| 11403574 | Method and system for optimizing an item assortment | Elif Tokar-Erdemir | 2022-08-02 |
| 11371737 | Optimization engine for energy sustainability | NIKITA KATYAL, Sourav Das, JAY GAYNOR, Matthew Johnson | 2022-06-28 |
| 10936778 | And optimization of physical cell placement | Vito Dai, Edward Kah Ching Teoh, Ji Xu | 2021-03-02 |
| 10339254 | Integrated circuit design systems and methods | Vito Dai, Edward Kah Ching Teoh, Ji Xu | 2019-07-02 |
| 9959380 | Integrated circuit design systems and methods | Vito Dai, Edward Kah Ching Teoh, Ji Xu | 2018-05-01 |
| 8028531 | Mitigating heat in an integrated circuit | Khoi A. Phan, Bhanwar Singh | 2011-10-04 |
| 7943289 | Inverse resist coating process | Michael K. Templeton, Ramkumar Subramanian | 2011-05-17 |
| 7604903 | Mask having sidewall absorbers to enable the printing of finer features in nanoprint lithography (1XMASK) | Bhanwar Singh, Srikanteswara Dakshina-Murthy, Khoi A. Phan, Ramkumar Subramanian | 2009-10-20 |
| 7591902 | Recirculation and reuse of dummy dispensed resist | Ramkumar Subramanian, Khoi A. Phan, Ursula Q. Quinto, Michael Templeton | 2009-09-22 |
| 7251033 | In-situ reticle contamination detection system at exposure wavelength | Khoi A. Phan, Bhanwar Singh, Ramkumar Subramanian | 2007-07-31 |
| 7224456 | In-situ defect monitor and control system for immersion medium in immersion lithography | Khoi A. Phan, Bhanwar Singh, Ramkumar Subramanian | 2007-05-29 |
| 7221060 | Composite alignment mark scheme for multi-layers in lithography | Bhanwar Singh, Khoi A. Phan, Iraj Emami, Ramkumar Subramanian | 2007-05-22 |
| 7173648 | System and method for visually monitoring a semiconductor processing system | Khoi A. Phan, Bhanwar Singh, Bryan K. Choo | 2007-02-06 |
| 7158896 | Real time immersion medium control using scatterometry | Bhanwar Singh, Srikanteswara Dakshina-Murthy, Khoi A. Phan, Ramkumar Subramanian, Iraj Emami | 2007-01-02 |
| 7153364 | Re-circulation and reuse of dummy-dispensed resist | Ramkumar Subramanian, Khoi A. Phan, Ursula Q. Quinto, Michael K. Templeton | 2006-12-26 |
| 7145653 | In situ particle monitoring for defect reduction | Michael K. Templeton | 2006-12-05 |
| 7084988 | System and method for creation of semiconductor multi-sloped features | Bhanwar Singh, Ramkumar Subramanian | 2006-08-01 |
| 7078348 | Dual layer patterning scheme to make dual damascene | Bhanwar Singh, Ramkumar Subramanian, Michael K. Templeton | 2006-07-18 |
| 7080330 | Concurrent measurement of critical dimension and overlay in semiconductor manufacturing | Bryan K. Choo, Bhanwar Singh, Carmen Morales | 2006-07-18 |
| 7069155 | Real time analytical monitor for soft defects on reticle during reticle inspection | Khoi A. Phan, Bhanwar Singh | 2006-06-27 |
| 7065737 | Multi-layer overlay measurement and correction technique for IC manufacturing | Khoi A. Phan, Bhanwar Singh | 2006-06-20 |
| 7065427 | Optical monitoring and control of two layers of liquid immersion media | Srikanteswara Dakshina-Murthy, Bhanwar Singh, Ramkumar Subramanian, Khoi A. Phan | 2006-06-20 |
| 7052575 | System and method for active control of etch process | Bhanwar Singh, Ramkumar Subramanian | 2006-05-30 |