Issued Patents All Time
Showing 26–50 of 190 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7034930 | System and method for defect identification and location using an optical indicia device | Ramkumar Subramanian, Khoi A. Phan | 2006-04-25 |
| 7001830 | System and method of pattern recognition and metrology structure for an X-initiative layout design | Khoi A. Phan, Bhanwar Singh | 2006-02-21 |
| 6999254 | Refractive index system monitor and control for immersion lithography | Khoi A. Phan, Bhanwar Singh, Ramkumar Subramanian | 2006-02-14 |
| 6982043 | Scatterometry with grating to observe resist removal rate during etch | Ramkumar Subramanian, Catherine B. Labelle, Bhanwar Singh, Christopher F. Lyons | 2006-01-03 |
| 6954678 | Artificial intelligence system for track defect problem solving | Khoi A. Phan, Bhanwar Singh, Ramkumar Subramanian | 2005-10-11 |
| 6934032 | Copper oxide monitoring by scatterometry/ellipsometry during nitride or BLOK removal in damascene process | Ramkumar Subramanian, Steven C. Avanzino, Bhanwar Singh | 2005-08-23 |
| 6931618 | Feed forward process control using scatterometry for reticle fabrication | Cyrus E. Tabery, Bhanwar Singh, Ramkumar Subramanian | 2005-08-16 |
| 6924157 | Real time particle monitor inside of plasma chamber during resist strip processing | Khoi A. Phan, Bhanwar Singh | 2005-08-02 |
| 6915177 | Comprehensive integrated lithographic process control system based on product design and yield feedback system | Khoi A. Phan, Bhanwar Singh, Ramkumar Subramanian | 2005-07-05 |
| 6912438 | Using scatterometry to obtain measurements of in circuit structures | Bryan K. Choo, Bhanwar Singh, Ramkumar Subramanian | 2005-06-28 |
| 6905950 | Growing copper vias or lines within a patterned resist using a copper seed layer | Ramkumar Subramanian, Michael K. Templeton, Bhanwar Singh | 2005-06-14 |
| 6889763 | System for rapidly and uniformly cooling resist | Ramkumar Subramanian, Michael K. Templeton | 2005-05-10 |
| 6878560 | Fab correlation system | Bhanwar Singh, Ramkumar Subramanian | 2005-04-12 |
| 6879406 | Use of scatterometry as a control tool in the manufacture of extreme UV masks | Ramkumar Subramanian, Bhanwar Singh | 2005-04-12 |
| 6879051 | Systems and methods to determine seed layer thickness of trench sidewalls | Bhanwar Singh, Michael K. Templeton, Ramkumar Subramanian | 2005-04-12 |
| 6864024 | Real-time control of chemically-amplified resist processing on wafer | Christopher F. Lyons | 2005-03-08 |
| 6844206 | Refractive index system monitor and control for immersion lithography | Khoi A. Phan, Bhanwar Singh, Ramkumar Subramanian | 2005-01-18 |
| 6819427 | Apparatus of monitoring and optimizing the development of a photoresist material | Ramkumar Subramanian, Michael K. Templeton | 2004-11-16 |
| 6818360 | Quartz mask crack monitor system for reticle by acoustic and/or laser scatterometry | Khoi A. Phan, Bhanwar Singh | 2004-11-16 |
| 6813574 | Topographically aligned layers and method for adjusting the relative alignment of layers and apparatus therefor | Sanjay K. Yedur, Bhanwar Singh, Ramkumar Subramanian | 2004-11-02 |
| 6808591 | Model based metal overetch control | Khoi A. Phan, Christopher F. Lyons, Steven C. Avanzino, Ramkumar Subramanian, Bhanwar Singh +1 more | 2004-10-26 |
| 6809793 | System and method to monitor reticle heating | Khoi A. Phan, Bhanwar Singh, Ramkumar Subramanian | 2004-10-26 |
| 6793765 | Situ monitoring of microloading using scatterometry with variable pitch gratings | Catherine B. Labelle, Bhanwar Singh | 2004-09-21 |
| 6790790 | High modulus filler for low k materials | Christopher F. Lyons | 2004-09-14 |
| 6784446 | Reticle defect printability verification by resist latent image comparison | Khoi A. Phan, Bhanwar Singh | 2004-08-31 |