Issued Patents All Time
Showing 51–75 of 190 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6778268 | System and method for process monitoring of polysilicon etch | Bhanwar Singh, Michael K. Templeton | 2004-08-17 |
| 6774989 | Interlayer dielectric void detection | Michael K. Templeton, Arvind Halliyal, Bhanwar Singh | 2004-08-10 |
| 6771374 | Scatterometry based measurements of a rotating substrate | Bhanwar Singh, Michael K. Templeton, Ramkumar Subramanian | 2004-08-03 |
| 6771356 | Scatterometry of grating structures to monitor wafer stress | Christopher F. Lyons, Bhanwar Singh, Steven C. Avanzino, Khoi A. Phan, Ramkumar Subramanian +1 more | 2004-08-03 |
| 6762133 | System and method for control of hardmask etch to prevent pattern collapse of ultra-thin resists | Ramkumar Subramanian, Khoi A. Phan | 2004-07-13 |
| 6758612 | System and method for developer endpoint detection by reflectometry or scatterometry | Cyrus E. Tabery, Bhanwar Singh, Ramkumar Subramanian | 2004-07-06 |
| 6746822 | Use of surface coupling agent to improve adhesion | Michael K. Templeton, Bhanwar Singh | 2004-06-08 |
| 6741445 | Method and system to monitor and control electro-static discharge | Khoi A. Phan, Bhanwar Singh, Ramkumar Subramanian | 2004-05-25 |
| 6724476 | Low defect metrology approach on clean track using integrated metrology | Khoi A. Phan, Bhanwar Singh | 2004-04-20 |
| 6704101 | Scatterometry based measurements of a moving substrate | Bhanwar Singh, Ramkumar Subramanian, Michael K. Templeton | 2004-03-09 |
| 6702648 | Use of scatterometry/reflectometry to measure thin film delamination during CMP | Steven C. Avanzino, Bhanwar Singh, Ramkumar Subramanian | 2004-03-09 |
| 6684172 | Sensor to predict void free films using various grating structures and characterize fill performance | Ramkumar Subramanian, Steven C. Avanzino, Christopher F. Lyons, Khoi A. Phan, Bhanwar Singh +1 more | 2004-01-27 |
| 6670271 | Growing a dual damascene structure using a copper seed layer and a damascene resist structure | Ramkumar Subramanian, Michael K. Templeton, Bhanwar Singh | 2003-12-30 |
| 6663723 | Vapor drying for cleaning photoresists | Michael K. Templeton, Ramkumar Subramanian, Khoi A. Phan | 2003-12-16 |
| 6653221 | Method of forming a ground in SOI structures | Ramkumar Subramanian, Bhanwar Singh | 2003-11-25 |
| 6654660 | Controlling thermal expansion of mask substrates by scatterometry | Bhanwar Singh, Christopher F. Lyons, Khoi A. Phan, Ramkumar Subramanian | 2003-11-25 |
| 6649426 | System and method for active control of spacer deposition | Michael K. Templeton, Bhanwar Singh | 2003-11-18 |
| 6650422 | Scatterometry techniques to ascertain asymmetry profile of features and generate a feedback or feedforward process control data associated therewith | Bhanwar Singh, Michael K. Templeton, Ramkumar Subramanian | 2003-11-18 |
| 6645702 | Treat resist surface to prevent pattern collapse | Michael K. Templeton, Bhanwar Singh | 2003-11-11 |
| 6641963 | System and method for in situ control of post exposure bake time and temperature | Michael K. Templeton, Bhanwar Singh, Ramkumar Subramanian | 2003-11-04 |
| 6643604 | System for uniformly heating photoresist | Ramkumar Subramanian, Michael K. Templeton | 2003-11-04 |
| 6634805 | Parallel plate development | Michael K. Templeton, Khoi A. Phan, Bryan K. Choo, Ramkumar Subramanian | 2003-10-21 |
| 6632283 | System and method for illuminating a semiconductor processing system | Bhanwar Singh, Khoi A. Phan, Bryan K. Choo, Ramkumar Subramanian | 2003-10-14 |
| 6630361 | Use of scatterometry for in-situ control of gaseous phase chemical trim process | Bhanwar Singh, Michael K. Templeton, Ramkumar Subramanian, Cristina Cheung | 2003-10-07 |
| 6629786 | Active control of developer time and temperature | Michael K. Templeton, Bhanwar Singh, Ramkumar Subramanian | 2003-10-07 |