Issued Patents All Time
Showing 25 most recent of 82 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8691647 | Memory devices containing a high-K dielectric layer | Wei Zheng, Mark T. Ramsbey, Jack F. Thomas | 2014-04-08 |
| 8368219 | Buried silicide local interconnect with sidewall spacers and method for making the same | Zoran Krivokapic, Matthew S. Buynoski, Nicholas H. Tripsas, Minh Van Ngo, Mark T. Ramsbey +2 more | 2013-02-05 |
| 8049334 | Buried silicide local interconnect with sidewall spacers and method for making the same | Zoran Krivokapic, Matthew S. Buynoski, Nicholas H. Tripsas, Minh Van Ngo, Mark T. Ramsbey +2 more | 2011-11-01 |
| 7786003 | Buried silicide local interconnect with sidewall spacers and method for making the same | Zoran Krivokapic, Matthew S. Buynoski, Nicholas H. Tripsas, Minh Van Ngo, Mark T. Ramsbey +2 more | 2010-08-31 |
| 7670936 | Nitridation of gate oxide by laser processing | Nicholas H. Tripsas, Mark T. Ramsbey | 2010-03-02 |
| 7297592 | Semiconductor memory with data retention liner | Minh Van Ngo, Tazrien Kamal, Hidehiko Shiraiwa, Rinji Sugino, Dawn Hopper +1 more | 2007-11-20 |
| 7163860 | Method of formation of gate stack spacer and charge storage materials having reduced hydrogen content in charge trapping dielectric flash memory device | Tazrien Kamal, Yun Wu, Mark T. Ramsbey, Jean Y. Yang, Rinji Sugino +2 more | 2007-01-16 |
| 7115469 | Integrated ONO processing for semiconductor devices using in-situ steam generation (ISSG) process | Mark T. Ramsbey, Hidehiko Shiraiwa, Jean Y. Yang | 2006-10-03 |
| 7079975 | Scatterometry and acoustic based active control of thin film deposition process | Bhanwar Singh, Ramkumar Subramanian | 2006-07-18 |
| 7074677 | Memory with improved charge-trapping dielectric layer | Minh Van Ngo, Hidehiko Shiraiwa, Rinji Sugino | 2006-07-11 |
| 7033957 | ONO fabrication process for increasing oxygen content at bottom oxide-substrate interface in flash memory devices | Hidehiko Shiraiwa, Tazrien Kamal, Mark T. Ramsbey, Inkuk Kang, Jaeyong Park +4 more | 2006-04-25 |
| 7018896 | UV-blocking layer for reducing UV-induced charging of SONOS dual-bit flash memory devices in BEOL processing | Minh Van Ngo, Tazrien Kamal, Mark T. Ramsbey, Jaeyong Park, Ning Cheng +6 more | 2006-03-28 |
| 7001814 | Laser thermal annealing methods for flash memory devices | Mark T. Ramsbey, Robert B. Ogle | 2006-02-21 |
| 6992370 | Memory cell structure having nitride layer with reduced charge loss and method for fabricating same | George Jonathan Kluth, Robert Clark-Phelps, Joong S. Jeon, Huicai Zhong, Mark T. Ramsbey +3 more | 2006-01-31 |
| 6969886 | ONO fabrication process for reducing oxygen vacancy content in bottom oxide layer in flash memory devices | Jaeyong Park, Hidehiko Shiraiwa, Jean Y. Yang, Inkuk Kang, Tazrien Kamal +1 more | 2005-11-29 |
| 6958511 | Flash memory device and method of fabrication thereof including a bottom oxide layer with two regions with different concentrations of nitrogen | Amir H. Jafarpour, Hidehiko Shiraiwa, Tazrien Kamal, Mark T. Ramsbey, Jaeyong Park | 2005-10-25 |
| 6955965 | Process for fabrication of nitride layer with reduced hydrogen content in ONO structure in semiconductor device | Tazrien Kamal, Hidehiko Shiraiwa, Jean Y. Yang | 2005-10-18 |
| 6955997 | Laser thermal annealing method for forming semiconductor low-k dielectric layer | Minh Van Ngo | 2005-10-18 |
| 6949481 | Process for fabrication of spacer layer with reduced hydrogen content in semiconductor device | Fred Cheung, Rinji Sugino, Hidehiko Shiraiwa, Tazrien Kamal, Jean Y. Yang | 2005-09-27 |
| 6949433 | Method of formation of semiconductor resistant to hot carrier injection stress | Shiraiwa Hidehiko, Jaeyong Park | 2005-09-27 |
| 6900121 | Laser thermal annealing to eliminate oxide voiding | Minh Van Ngo, Dawn Hopper | 2005-05-31 |
| 6884681 | Method of manufacturing a semiconductor memory with deuterated materials | Tazrien Kamal, Minh Van Ngo, Mark T. Ramsbey, Jean Y. Yang, Hidehiko Shiraiwa +1 more | 2005-04-26 |
| 6872643 | Implant damage removal by laser thermal annealing | Nicholas H. Tripsas, Mark T. Ramsbey | 2005-03-29 |
| 6858496 | Oxidizing pretreatment of ONO layer for flash memory | Robert B. Ogle | 2005-02-22 |
| 6849925 | Preparation of composite high-K/standard-K dielectrics for semiconductor devices | Joong S. Jeon, Minh Van Ngo, Robert B. Ogle | 2005-02-01 |