| 8691647 |
Memory devices containing a high-K dielectric layer |
Wei Zheng, Mark T. Ramsbey, Jack F. Thomas |
2014-04-08 |
$1,440,000 |
| 8368219 |
Buried silicide local interconnect with sidewall spacers and method for making the same |
Zoran Krivokapic, Matthew S. Buynoski, Nicholas H. Tripsas, Minh Van Ngo, Mark T. Ramsbey +2 more |
2013-02-05 |
|
| 8049334 |
Buried silicide local interconnect with sidewall spacers and method for making the same |
Zoran Krivokapic, Matthew S. Buynoski, Nicholas H. Tripsas, Minh Van Ngo, Mark T. Ramsbey +2 more |
2011-11-01 |
$1,838,000 |
| 7786003 |
Buried silicide local interconnect with sidewall spacers and method for making the same |
Zoran Krivokapic, Matthew S. Buynoski, Nicholas H. Tripsas, Minh Van Ngo, Mark T. Ramsbey +2 more |
2010-08-31 |
|
| 7670936 |
Nitridation of gate oxide by laser processing |
Nicholas H. Tripsas, Mark T. Ramsbey |
2010-03-02 |
$5,781,000 |
| 7297592 |
Semiconductor memory with data retention liner |
Minh Van Ngo, Tazrien Kamal, Hidehiko Shiraiwa, Rinji Sugino, Dawn Hopper +1 more |
2007-11-20 |
$6,431,000 |
| 7163860 |
Method of formation of gate stack spacer and charge storage materials having reduced hydrogen content in charge trapping dielectric flash memory device |
Tazrien Kamal, Yun Wu, Mark T. Ramsbey, Jean Y. Yang, Rinji Sugino +2 more |
2007-01-16 |
$6,080,000 |
| 7115469 |
Integrated ONO processing for semiconductor devices using in-situ steam generation (ISSG) process |
Mark T. Ramsbey, Hidehiko Shiraiwa, Jean Y. Yang |
2006-10-03 |
$7,557,000 |
| 7079975 |
Scatterometry and acoustic based active control of thin film deposition process |
Bhanwar Singh, Ramkumar Subramanian |
2006-07-18 |
$7,111,000 |
| 7074677 |
Memory with improved charge-trapping dielectric layer |
Minh Van Ngo, Hidehiko Shiraiwa, Rinji Sugino |
2006-07-11 |
|
| 7033957 |
ONO fabrication process for increasing oxygen content at bottom oxide-substrate interface in flash memory devices |
Hidehiko Shiraiwa, Tazrien Kamal, Mark T. Ramsbey, Inkuk Kang, Jaeyong Park +4 more |
2006-04-25 |
|
| 7018896 |
UV-blocking layer for reducing UV-induced charging of SONOS dual-bit flash memory devices in BEOL processing |
Minh Van Ngo, Tazrien Kamal, Mark T. Ramsbey, Jaeyong Park, Ning Cheng +6 more |
2006-03-28 |
$11,294,000 |
| 7001814 |
Laser thermal annealing methods for flash memory devices |
Mark T. Ramsbey, Robert B. Ogle |
2006-02-21 |
$12,668,000 |
| 6992370 |
Memory cell structure having nitride layer with reduced charge loss and method for fabricating same |
George Jonathan Kluth, Robert Clark-Phelps, Joong S. Jeon, Huicai Zhong, Mark T. Ramsbey +3 more |
2006-01-31 |
$15,487,000 |
| 6969886 |
ONO fabrication process for reducing oxygen vacancy content in bottom oxide layer in flash memory devices |
Jaeyong Park, Hidehiko Shiraiwa, Jean Y. Yang, Inkuk Kang, Tazrien Kamal +1 more |
2005-11-29 |
|
| 6958511 |
Flash memory device and method of fabrication thereof including a bottom oxide layer with two regions with different concentrations of nitrogen |
Amir H. Jafarpour, Hidehiko Shiraiwa, Tazrien Kamal, Mark T. Ramsbey, Jaeyong Park |
2005-10-25 |
|
| 6955965 |
Process for fabrication of nitride layer with reduced hydrogen content in ONO structure in semiconductor device |
Tazrien Kamal, Hidehiko Shiraiwa, Jean Y. Yang |
2005-10-18 |
|
| 6955997 |
Laser thermal annealing method for forming semiconductor low-k dielectric layer |
Minh Van Ngo |
2005-10-18 |
$5,936,000 |
| 6949481 |
Process for fabrication of spacer layer with reduced hydrogen content in semiconductor device |
Fred Cheung, Rinji Sugino, Hidehiko Shiraiwa, Tazrien Kamal, Jean Y. Yang |
2005-09-27 |
|
| 6949433 |
Method of formation of semiconductor resistant to hot carrier injection stress |
Shiraiwa Hidehiko, Jaeyong Park |
2005-09-27 |
|
| 6900121 |
Laser thermal annealing to eliminate oxide voiding |
Minh Van Ngo, Dawn Hopper |
2005-05-31 |
$6,268,000 |
| 6884681 |
Method of manufacturing a semiconductor memory with deuterated materials |
Tazrien Kamal, Minh Van Ngo, Mark T. Ramsbey, Jean Y. Yang, Hidehiko Shiraiwa +1 more |
2005-04-26 |
|
| 6872643 |
Implant damage removal by laser thermal annealing |
Nicholas H. Tripsas, Mark T. Ramsbey |
2005-03-29 |
$4,814,000 |
| 6858496 |
Oxidizing pretreatment of ONO layer for flash memory |
Robert B. Ogle |
2005-02-22 |
$8,271,000 |
| 6849925 |
Preparation of composite high-K/standard-K dielectrics for semiconductor devices |
Joong S. Jeon, Minh Van Ngo, Robert B. Ogle |
2005-02-01 |
$6,992,000 |
