Issued Patents All Time
Showing 25 most recent of 68 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9318333 | Dielectric extension to mitigate short channel effects | Vidyut Gopal, Shankar Sinha, Phillip Jones | 2016-04-19 |
| 8673716 | Memory manufacturing process with bitline isolation | Mark T. Ramsbey, Tazrien Kamal, Emmanuil Lingunis, Hidehiko Shiraiwa, Yu Sun | 2014-03-18 |
| 8415734 | Memory device protection layer | Rinji Sugino, Timothy Thurgate, Michael Brennan | 2013-04-09 |
| 8404541 | Strapping contact for charge protection | Wei Zheng, Mark Randolph, Ming Sang Kwan, Yi He, Zhizheng Liu +1 more | 2013-03-26 |
| 7977218 | Thin oxide dummy tiling as charge protection | Cinti X. Chen, Yi He, Wenmei Li, Zhizheng Liu, Ming Sang Kwan +1 more | 2011-07-12 |
| 7750407 | Strapping contact for charge protection | Wei Zheng, Mark Randolph, Ming Sang Kwan, Yi He, Zhizheng Liu +1 more | 2010-07-06 |
| 7696094 | Method for improved planarization in semiconductor devices | David Matsumoto, Michael Brennan, Vidyut Gopal | 2010-04-13 |
| 7553727 | Using implanted poly-1 to improve charging protection in dual-poly process | Ming Sang Kwan, Bradley Marc Davis, Zhizheng Liu, Yi He | 2009-06-30 |
| 7432178 | Bit line implant | Angela T. Hui, Yu Sun, Mark T. Ramsbey, Weidong Qian | 2008-10-07 |
| 7307027 | Void free interlayer dielectric | Minh Van Ngo, Alexander H. Nickel, Hieu Pham, Hirokazu Tokuno, Weidong Qian | 2007-12-11 |
| 7163860 | Method of formation of gate stack spacer and charge storage materials having reduced hydrogen content in charge trapping dielectric flash memory device | Tazrien Kamal, Yun Wu, Mark T. Ramsbey, Arvind Halliyal, Rinji Sugino +2 more | 2007-01-16 |
| 7115469 | Integrated ONO processing for semiconductor devices using in-situ steam generation (ISSG) process | Arvind Halliyal, Mark T. Ramsbey, Hidehiko Shiraiwa | 2006-10-03 |
| 7098546 | Alignment marks with salicided spacers between bitlines for alignment signal improvement | Emmanuil H. Lingunis, Hidehiko Shiraiwa | 2006-08-29 |
| 7078749 | Memory structure having tunable interlayer dielectric and method for fabricating same | Yider Wu | 2006-07-18 |
| 7052961 | Method for forming wordlines having irregular spacing in a memory array | Hidehiko Shiraiwa, Jaeyong Park, Cyrus E. Tabery | 2006-05-30 |
| 7033957 | ONO fabrication process for increasing oxygen content at bottom oxide-substrate interface in flash memory devices | Hidehiko Shiraiwa, Tazrien Kamal, Mark T. Ramsbey, Inkuk Kang, Jaeyong Park +4 more | 2006-04-25 |
| 7023046 | Undoped oxide liner/BPSG for improved data retention | Minh Van Ngo, Angela T. Hui, Ning Cheng, Jeyong Park, Robert A. Huertas +3 more | 2006-04-04 |
| 7018868 | Disposable hard mask for memory bitline scaling | Jeff P. Erhardt, Cyrus E. Tabery, Weidong Qian, Mark T. Ramsbey, Jaeyong Park +1 more | 2006-03-28 |
| 6994939 | Semiconductor manufacturing resolution enhancement system and method for simultaneously patterning different feature types | Kouros Ghandehari, Christopher A. Spence | 2006-02-07 |
| 6989563 | Flash memory cell with UV protective layer | Krishnashree Achuthan, Patrick K. Cheung, Cyrus E. Tabery, Ning Cheng, Minh Van Ngo | 2006-01-24 |
| 6989320 | Bitline implant utilizing dual poly | Weidong Qian, Mark T. Ramsbey, Sameer Haddad | 2006-01-24 |
| 6987048 | Memory device having silicided bitlines and method of forming the same | Ning Cheng, Hiroyuki Kinoshita, Jeff P. Erhardt, Mark T. Ramsbey, Cyrus E. Tabery | 2006-01-17 |
| 6969886 | ONO fabrication process for reducing oxygen vacancy content in bottom oxide layer in flash memory devices | Jaeyong Park, Hidehiko Shiraiwa, Arvind Halliyal, Inkuk Kang, Tazrien Kamal +1 more | 2005-11-29 |
| 6955965 | Process for fabrication of nitride layer with reduced hydrogen content in ONO structure in semiconductor device | Arvind Halliyal, Tazrien Kamal, Hidehiko Shiraiwa | 2005-10-18 |
| 6949481 | Process for fabrication of spacer layer with reduced hydrogen content in semiconductor device | Arvind Halliyal, Fred Cheung, Rinji Sugino, Hidehiko Shiraiwa, Tazrien Kamal | 2005-09-27 |