Issued Patents All Time
Showing 25 most recent of 38 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8309457 | Multilayer low reflectivity hard mask and process therefor | Anna M. Minvielle, Marina V. Plat, Hirokazu Tokuno | 2012-11-13 |
| 8048797 | Multilayer low reflectivity hard mask and process therefor | Anna M. Minvielle, Marina V. Plat, Hirokazu Tokuno | 2011-11-01 |
| 7977797 | Integrated circuit with contact region and multiple etch stop insulation layer | Wenmei Li, Angela T. Hui, Dawn Hopper | 2011-07-12 |
| 7888269 | Triple layer anti-reflective hard mask | Hirokazu Tokuno, David Matsumoto, Christopher H. Raeder, Christopher Foster, Weidong Qian +1 more | 2011-02-15 |
| 7572727 | Semiconductor formation method that utilizes multiple etch stop layers | Wenmei Li, Angela T. Hui, Dawn Hopper | 2009-08-11 |
| 7538026 | Multilayer low reflectivity hard mask and process therefor | Anna M. Minvielle, Marina V. Plat, Hirokazu Tokuno | 2009-05-26 |
| 7507661 | Method of forming narrowly spaced flash memory contact openings and lithography masks | Emmanuil H. Lingunis, Ning Cheng, Mark T. Ramsbey, Anna M. Minvielle, Hung-Eil Kim | 2009-03-24 |
| 7361587 | Semiconductor contact and nitride spacer formation system and method | Wenmei Li, Angela T. Hui, Dawn Hopper | 2008-04-22 |
| 7070911 | Structure and method for reducing standing waves in a photoresist | Dawn Hopper, Minh Van Ngo | 2006-07-04 |
| 6994939 | Semiconductor manufacturing resolution enhancement system and method for simultaneously patterning different feature types | Jean Y. Yang, Christopher A. Spence | 2006-02-07 |
| 6962849 | Hard mask spacer for sublithographic bitline | Tazrien Kamal, Weidong Qian, Taraneh Jamali-Beh, Mark T. Ramsbey, Ashok M. Khathuria | 2005-11-08 |
| 6902851 | Method for using phase-shifting mask | Carl P. Babcock | 2005-06-07 |
| 6894342 | Structure and method for preventing UV radiation damage in a memory cell and improving contact CD control | Angela T. Hui, Minh Van Ngo, Ning Cheng, Jaeyong Park, Jean Y. Yang +2 more | 2005-05-17 |
| 6872609 | Narrow bitline using Safier for mirrorbit | Tazrien Kamal, Weidong Qian, Taraneh Jamali-Beh | 2005-03-29 |
| 6867063 | Organic spin-on anti-reflective coating over inorganic anti-reflective coating | Dawn Hopper, Wenmei Li, Angela T. Hui | 2005-03-15 |
| 6833581 | Structure and method for preventing process-induced UV radiation damage in a memory cell | Angela T. Hui, Minh Van Ngo, Ning Cheng, Jaeyong Park, Jean Y. Yang +1 more | 2004-12-21 |
| 6818141 | Application of the CVD bilayer ARC as a hard mask for definition of the subresolution trench features between polysilicon wordlines | Marina V. Plat | 2004-11-16 |
| 6720133 | Memory manufacturing process using disposable ARC for wordline formation | Mark T. Ramsbey, Tazrien Kamal, Jean Y. Yang, Emmanuil H. Lingunis, Hidehiko Shiraiwa | 2004-04-13 |
| 6673524 | Attenuating extreme ultraviolet (EUV) phase-shifting mask fabrication method | Bruno M. LaFontaine, Bhanwar Singh | 2004-01-06 |
| 6667212 | Alignment system for planar charge trapping dielectric memory cell lithography | Hidehiko Shiraiwa, Jean Y. Yang | 2003-12-23 |
| 6664030 | System for and method of constructing an alternating phase-shifting mask | Bruno M. LaFontaine, Bhanwar Singh | 2003-12-16 |
| 6653190 | Flash memory with controlled wordline width | Jean Y. Yang, Tazrien Kamal, Minh Van Ngo, Mark T. Ramsbey, Dawn Hopper +2 more | 2003-11-25 |
| 6645679 | Attenuated phase shift mask for use in EUV lithography and a method of making such a mask | Bruno La Fontaine, Calvin T. Gabriel, Harry J. Levinson | 2003-11-11 |
| 6642148 | RELACS shrink method applied for single print resist mask for LDD or buried bitline implants using chemically amplified DUV type photoresist | Emmanuil H. Lingunis, Mark S. Chang, Angela T. Hui, Scott A. Bell, Jusuke Ogura | 2003-11-04 |
| 6620717 | Memory with disposable ARC for wordline formation | Tazrien Kamal, Scott A. Bell, Mark T. Ramsbey, Jeffrey A. Shields, Jean Y. Yang | 2003-09-16 |