Issued Patents All Time
Showing 1–19 of 19 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11733613 | Prediction of out of specification based on a spatial characteristic of process variability | Wenjin Huang, Hongmei Li, Huina Xu | 2023-08-22 |
| 11669020 | Method and apparatus for pattern fidelity control | Tanbir HASAN, Vivek Jain, Stefan Hunsche | 2023-06-06 |
| 11403453 | Defect prediction | Lin Lee Cheong, Marc Jurian Kea, Yasri Yudhistira, Maxime Philippe Frederic Genin | 2022-08-02 |
| 11126092 | Methods for determining an approximate value of a processing parameter at which a characteristic of the patterning process has a target value | Lin Lee Cheong, Wenjin Huang | 2021-09-21 |
| 10908515 | Method and apparatus for pattern fidelity control | Tanbir HASAN, Vivek Jain, Stefan Hunsche | 2021-02-02 |
| 10185234 | Harsh environment optical element protection | Alexander I. Ershov, Norbert Bowering, Silvia De Dea | 2019-01-22 |
| 9557650 | Transport system for an extreme ultraviolet light source | Silvia De Dea, Alexander I. Ershov, Brandon Wilson Verhoff, Gregory J. Wilson | 2017-01-31 |
| 9560730 | Transport system for an extreme ultraviolet light source | Silvia De Dea, Alexander I. Ershov, Brandon Wilson Verhoff, Gregory J. Wilson | 2017-01-31 |
| 8642474 | Spacer lithography | Ryoung-Han Kim, Yunfei Deng, Thomas I. Wallow | 2014-02-04 |
| 7101645 | Reflective mask for short wavelength lithography | Laurent Dieu | 2006-09-05 |
| 6872497 | Reflective mask for short wavelength lithography | Harry J. Levinson | 2005-03-29 |
| 6710853 | Phase grating focus monitor using overlay technique | Jongwook Kye, Harry J. Levinson | 2004-03-23 |
| 6645679 | Attenuated phase shift mask for use in EUV lithography and a method of making such a mask | Calvin T. Gabriel, Harry J. Levinson, Kouros Ghandehari | 2003-11-11 |
| 6608321 | Differential wavelength inspection system | Harry J. Levinson, Jeffrey A. Schefske | 2003-08-19 |
| 6603543 | Inspection system with enhanced contrast | — | 2003-08-05 |
| 6556286 | Inspection system for the pupil of a lithographic tool | Harry J. Levinson, Jongwook Kye | 2003-04-29 |
| 6555274 | Pupil filtering for a lithographic tool | Jongwook Kye | 2003-04-29 |
| 6535280 | Phase-shift-moiré focus monitor | Jongwook Kye, Harry J. Levinson | 2003-03-18 |
| 5498923 | Fluoresence imaging | Donald L. White, Obert R. Wood, II | 1996-03-12 |