Issued Patents All Time
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| RE50384 | Multilayer interconnect structure and method for integrated circuits | — | 2025-04-15 |
| 10950488 | Integration of finFET device | Kwanyong LIM, Youn Sung Choi | 2021-03-16 |
| 9029263 | Method of printing multiple structure widths using spacer double patterning | Youn Sung Choi | 2015-05-12 |
| 8815748 | Method of forming semiconductor device with multiple level patterning | Thomas I. Wallow, Jongwook Kye, Harry J. Levinson | 2014-08-26 |
| 8792161 | Optical polarizer with nanotube array | Bruno M. LaFontaine, Harry J. Levinson, Uzodinma Okoroanyanwu | 2014-07-29 |
| 8664113 | Multilayer interconnect structure and method for integrated circuits | — | 2014-03-04 |
| 8642474 | Spacer lithography | Yunfei Deng, Thomas I. Wallow, Bruno La Fontaine | 2014-02-04 |
| 8586269 | Method for forming a high resolution resist pattern on a semiconductor wafer | Uzodinma Okoroanyanwu, Harry J. Levinson, Thomas I. Wallow | 2013-11-19 |
| 8450833 | Spacer double patterning that prints multiple CD in front-end-of-line | — | 2013-05-28 |
| 8445182 | Double exposure technology using high etching selectivity | Jong-wook Kye | 2013-05-21 |
| 8435884 | Method for forming an interconnect structure | Matthew E. Colburn | 2013-05-07 |
| 8303831 | Methods for fabricating semiconductor devices | — | 2012-11-06 |
| 8236592 | Method of forming semiconductor device | Thomas I. Wallow, Harry J. Levinson, Jongwook Kye, Alden Acheta | 2012-08-07 |
| 8009274 | In-die focus monitoring with binary mask | — | 2011-08-30 |
| 7851136 | Stabilization of deep ultraviolet photoresist | Harry J. Levinson, Thomas I. Wallow | 2010-12-14 |
| 7829266 | Multiple exposure technique using OPC to correct distortion | Yunfei Deng, Jongwook Kye | 2010-11-09 |
| 7767985 | EUV pellicle and method for fabricating semiconductor dies using same | Uzodinma Okoroanyanwu | 2010-08-03 |
| 7723704 | EUV pellicle with increased EUV light transmittance | Obert R. Wood, II, Thomas I. Wallow | 2010-05-25 |
| 7718529 | Inverse self-aligned spacer lithography | Yunfei Deng, Thomas I. Wallow | 2010-05-18 |
| 7704680 | Double exposure technology using high etching selectivity | Jong-wook Kye | 2010-04-27 |
| 7663127 | EUV debris mitigation filter and method for fabricating semiconductor dies using same | Obert R. Wood, II, Thomas I. Wallow | 2010-02-16 |