| 9287168 |
Semiconductor device and process for producing the same |
Hiroshi Morioka, Sergey Pidin |
2016-03-15 |
|
| 8884375 |
Semiconductor integrated circuit device |
Satoshi Nakai, Masato Suga |
2014-11-11 |
|
| 8790974 |
Method of manufacturing semiconductor integrated circuit device |
Satoshi Nakai, Masato Suga |
2014-07-29 |
|
| 8749062 |
Semiconductor device and process for producing the same |
Hiroshi Morioka, Sergey Pidin |
2014-06-10 |
|
| 8518795 |
Method of manufacturing semiconductor device |
Hikaru Kokura, Hideyuki Kojima, Toru Anezaki, Hiroyuki Ogawa, Junichi Ariyoshi |
2013-08-27 |
|
| 8368219 |
Buried silicide local interconnect with sidewall spacers and method for making the same |
Arvind Halliyal, Zoran Krivokapic, Matthew S. Buynoski, Nicholas H. Tripsas, Minh Van Ngo +2 more |
2013-02-05 |
|
| 8362569 |
Semiconductor device and semiconductor device fabrication method |
Tomoyuki Kirimura |
2013-01-29 |
|
| 8173514 |
Method of manufacturing semiconductor device |
Hikaru Kokura, Hideyuki Kojima, Toru Anezaki, Hiroyuki Ogawa, Junichi Ariyoshi |
2012-05-08 |
|
| 8049334 |
Buried silicide local interconnect with sidewall spacers and method for making the same |
Arvind Halliyal, Zoran Krivokapic, Matthew S. Buynoski, Nicholas H. Tripsas, Minh Van Ngo +2 more |
2011-11-01 |
$1,838,000 |
| 7892969 |
Method of manufacturing semiconductor device |
Masanori Tsutsumi |
2011-02-22 |
|
| 7816206 |
Semiconductor device and method for fabricating the same |
— |
2010-10-19 |
|
| 7786003 |
Buried silicide local interconnect with sidewall spacers and method for making the same |
Arvind Halliyal, Zoran Krivokapic, Matthew S. Buynoski, Nicholas H. Tripsas, Minh Van Ngo +2 more |
2010-08-31 |
|
| 7265014 |
Avoiding field oxide gouging in shallow trench isolation (STI) regions |
Angela T. Hui, Yider Wu |
2007-09-04 |
$3,914,000 |
| 7199426 |
Nonvolatile semiconductor memory device and method for fabricating the same |
Hiroyuki Ogawa, Tatsuo Chijimatsu |
2007-04-03 |
|
| 6828199 |
Monos device having buried metal silicide bit line |
Mark T. Ramsbey, Arvind Halliyal, Zoran Krivokapic, Minh Van Ngo, Nicholas H. Tripisas |
2004-12-07 |
$8,137,000 |
| 6809033 |
Innovative method of hard mask removal |
Angela T. Hui |
2004-10-26 |
|
| 6713809 |
Dual bit memory device with isolated polysilicon floating gates |
Kazuhiro Kurihara, Masaru Yano, Hideki Komori, Tuan Pham, Angela T. Hui |
2004-03-30 |
$4,272,000 |
| 6642148 |
RELACS shrink method applied for single print resist mask for LDD or buried bitline implants using chemically amplified DUV type photoresist |
Kouros Ghandehari, Emmanuil H. Lingunis, Mark S. Chang, Angela T. Hui, Scott A. Bell |
2003-11-04 |
$3,831,000 |
| 6617215 |
Memory wordline hard mask |
Arvind Halliyal, Tazrien Kamal, Minh Van Ngo, Mark T. Ramsbey, Jeffrey A. Shields +3 more |
2003-09-09 |
$4,832,000 |
| 6573140 |
Process for making a dual bit memory device with isolated polysilicon floating gates |
Kiyoshi Izumi, Masaru Yano, Hideki Komori, Tuan Pham, Angela T. Hui |
2003-06-03 |
$3,251,000 |
| 6537866 |
Method of forming narrow insulating spacers for use in reducing minimum component size |
Jeffrey A. Shields, Tuan Pham, Bharath Rangarajan, Simon S. Chan |
2003-03-25 |
$2,887,000 |
| 6479411 |
Method for forming high quality multiple thickness oxide using high temperature descum |
Angela T. Hui |
2002-11-12 |
|
| 6461973 |
Method for forming high quality multiple thickness oxide layers by reducing descum induced defects |
Angela T. Hui |
2002-10-08 |
$890,000 |
| 6432618 |
Method for forming high quality multiple thickness oxide layers by reducing descum induced defects |
Angela T. Hui |
2002-08-13 |
$2,174,000 |
