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Home › RELACS shrink method applied for single print resist mask for LDD or buried bitline implants using chemically amplified DUV type photoresist

RELACS shrink method applied for single print resist mask for LDD or buried bitline implants using chemically amplified DUV type photoresist

US Patent 6642148 · Granted Nov 4, 2003

Estimated economic value: $3,831,000 ⓘ

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