HK

Hideki Komori

AM AMD: 14 patents #820 of 9,279Top 9%
Fujitsu Limited: 12 patents #2,592 of 24,456Top 15%
SL Spansion Llc.: 4 patents #203 of 769Top 30%
Mitsubishi Electric: 3 patents #8,691 of 25,717Top 35%
FL Fujitsu Amd Semiconductor Limited: 2 patents #3 of 40Top 8%
NC Nippon Paint Holdings Co.: 1 patents #415 of 834Top 50%
Overall (All Time): #223,797 of 4,157,543Top 6%
20
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
9390995 Semiconductor device and method of manufacturing the same Kei Yamamoto, Kazuhiro Tada, Toru Kimura, Masaki Goto, Hiroyuki Yoshihara 2016-07-12
7759745 Semiconductor memory device Hisayuki Shimada, Yu Sun, Hiroyuki Kinoshita 2010-07-20
7482226 Semiconductor memory device Hisayuki Shimada, Yu Sun, Hiroyuki Kinoshita 2009-01-27
7227780 Semiconductor device and control method thereof Shouichi Kawamura, Masanori Taya 2007-06-05
7202540 Semiconductor memory device Hisayuki Shimada, Yu Sun, Hiroyuki Kinoshita 2007-04-10
6713809 Dual bit memory device with isolated polysilicon floating gates Jusuke Ogura, Kazuhiro Kurihara, Masaru Yano, Tuan Pham, Angela T. Hui 2004-03-30
6579769 Semiconductor device manufacturing method including forming FOX with dual oxidation Hiroyuki Shimada, Masaaki Higashitani, Hideo Kurihara, Satoshi Takahashi 2003-06-17
6573140 Process for making a dual bit memory device with isolated polysilicon floating gates Jusuke Ogura, Kiyoshi Izumi, Masaru Yano, Tuan Pham, Angela T. Hui 2003-06-03
6528390 Process for fabricating a non-volatile memory device David K. Foote, Fei Wang, Bharath Rangarajan 2003-03-04
6265268 High temperature oxide deposition process for fabricating an ONO floating-gate electrode in a two bit EEPROM device Arvind Halliyal, Robert B. Ogle, Kenneth Wo-Wai Au 2001-07-24
6248628 Method of fabricating an ONO dielectric by nitridation for MNOS memory cells Arvind Halliyal, David K. Foote, Kenneth Wo-Wai Au 2001-06-19
6248635 Process for fabricating a bit-line in a monos device using a dual layer hard mask David K. Foote, Bharath Rangarajan, Steven K. Park 2001-06-19
6242305 Process for fabricating a bit-line using buried diffusion isolation David K. Foote, Bharath Rangarajan, Fei Wang 2001-06-05
6218227 Method to generate a MONOS type flash cell using polycrystalline silicon as an ONO top layer Steven K. Park, Arvind Halliyal 2001-04-17
6187640 Semiconductor device manufacturing method including various oxidation steps with different concentration of chlorine to form a field oxide Hiroyuki Shimada, Masaaki Higashitani, Hideo Kurihara, Satoshi Takahashi 2001-02-13
6117730 Integrated method by using high temperature oxide for top oxide and periphery gate oxide Kenneth Wo-Wai Au, Mark Ramsbey 2000-09-12
5976260 Semiconductor producing apparatus, and wafer vacuum chucking device, gas cleaning method and nitride film forming method in semiconductor producing apparatus Yoshimi Kinoshita, Tomoyuki Kanda, Katsuhisa Kitano, Kazuo Yoshida, Hiroshi Ohnishi +9 more 1999-11-02
5950086 Method of fabricating an EPROM type device with reduced process residues Satoshi Takahashi, Tatsuya Kajita, Hideo Kurihara, Masaaki Higashitani 1999-09-07
5770304 Wide bandwidth electromagnetic wave absorbing material Koji Nakamura, Mitsuyuki Oda, Kazunori Kanda 1998-06-23
5534073 Semiconductor producing apparatus comprising wafer vacuum chucking device Yoshimi Kinoshita, Tomoyuki Kanda, Katsuhisa Kitano, Kazuo Yoshida, Hiroshi Ohnishi +9 more 1996-07-09