| 10026436 |
Apparatus and methods for supporting workpieces during plasma processing |
James D. Getty |
2018-07-17 |
$22,397,000 |
| 9385017 |
Apparatus and methods for handling workpieces of different sizes |
James P. Fazio, James D. Getty |
2016-07-05 |
$13,905,000 |
| 9382623 |
Apparatus and method for intraluminal polymer deposition |
— |
2016-07-05 |
$13,905,000 |
| 8597982 |
Methods of fabricating electronics assemblies |
James D. Getty, Jiangang Zhao |
2013-12-03 |
$10,093,000 |
| 8313455 |
Syringes with a reduced susceptibility to freeze-thaw void formation and methods of manufacturing such syringes |
Henry DiGregorio, James D. Getty |
2012-11-20 |
$7,773,000 |
| 8268675 |
Passivation layer for semiconductor device packaging |
James D. Getty |
2012-09-18 |
$25,199,000 |
| 8231568 |
Syringes with a reduced susceptibility to freeze-thaw void formation and methods of manufacturing such syringes |
Henry DiGregorio, James D. Getty |
2012-07-31 |
$20,810,000 |
| 6903007 |
Process for forming bottom anti-reflection coating for semiconductor fabrication photolithography which inhibits photoresist footing |
Minh Van Ngo |
2005-06-07 |
$8,078,000 |
| 6562683 |
Bit-line oxidation by removing ONO oxide prior to bit-line implant |
Fei Wang, Stephen Keetai Park |
2003-05-13 |
$1,759,000 |
| 6537881 |
Process for fabricating a non-volatile memory device |
Bharath Rangarajan, Fei Wang, Steven K. Park |
2003-03-25 |
$2,887,000 |
| 6528390 |
Process for fabricating a non-volatile memory device |
Hideki Komori, Fei Wang, Bharath Rangarajan |
2003-03-04 |
$1,276,000 |
| 6486029 |
Integration of an ion implant hard mask structure into a process for fabricating high density memory cells |
Bharath Rangarajan, Stephan K. Park, Fei Wang, Dawn Hopper, Jack F. Thomas +2 more |
2002-11-26 |
$2,975,000 |
| 6458677 |
Process for fabricating an ONO structure |
Dawn Hopper, Bharath Rangarajan |
2002-10-01 |
$734,000 |
| 6436766 |
Process for fabricating high density memory cells using a polysilicon hard mask |
Bharath Rangarajan, Fei Wang, Dawn Hopper, Stephen Keetai Park, Jack F. Thomas +2 more |
2002-08-20 |
$3,107,000 |
| 6410388 |
Process for optimizing pocket implant profile by RTA implant annealing for a non-volatile semiconductor device |
George Jonathan Kluth, Stephen Keetai Park, Arvind Halliyal |
2002-06-25 |
$2,000,000 |
| 6406960 |
Process for fabricating an ONO structure having a silicon-rich silicon nitride layer |
Dawn Hopper, Bharath Rangarajan, Arvind Halliyal |
2002-06-18 |
$3,499,000 |
| 6399480 |
Methods and arrangements for insulating local interconnects for improved alignment tolerance and size reduction |
William G. En, Darin A. Chan, Fei Wang, Minh Van Ngo |
2002-06-04 |
$2,015,000 |
| 6399446 |
Process for fabricating high density memory cells using a metallic hard mask |
Bharath Rangarajan, Fei Wang, Dawn Hopper, Stephen Keetai Park, Jack F. Thomas +2 more |
2002-06-04 |
$2,015,000 |
| 6395644 |
Process for fabricating a semiconductor device using a silicon-rich silicon nitride ARC |
Dawn Hopper, Minh Van Ngo |
2002-05-28 |
$2,985,000 |
| 6380588 |
Semiconductor device having uniform spacers |
William G. En, Minh Van Ngo, Chih-Yuk Yang, Scott A. Bell, Olov Karlsson +1 more |
2002-04-30 |
$1,930,000 |
| 6376308 |
Process for fabricating an EEPROM device having a pocket substrate region |
Fei Wang, Bharath Rangarajan, George J. Kluth |
2002-04-23 |
$2,653,000 |
| 6365320 |
Process for forming anti-reflective film for semiconductor fabrication using extremely short wavelength deep ultraviolet photolithography |
Subhash Gupta |
2002-04-02 |
$3,760,000 |
| 6313018 |
Process for fabricating semiconductor device including antireflective etch stop layer |
Fei Wang, Myron R. Cagan, Subhash Gupta |
2001-11-06 |
$9,019,000 |
| 6297143 |
Process for forming a bit-line in a MONOS device |
Bharath Rangarajan, Fei Wang, Steven K. Park |
2001-10-02 |
$2,425,000 |
| 6248628 |
Method of fabricating an ONO dielectric by nitridation for MNOS memory cells |
Arvind Halliyal, Hideki Komori, Kenneth Wo-Wai Au |
2001-06-19 |
$7,293,000 |
