DF

David K. Foote

AM AMD: 35 patents #255 of 9,279Top 3%
NO Nordson: 7 patents #133 of 1,063Top 15%
Fujitsu Limited: 1 patents #14,843 of 24,456Top 65%
📍 San Jose, CA: #1,288 of 32,062 inventorsTop 5%
🗺 California: #10,539 of 386,348 inventorsTop 3%
Overall (All Time): #73,642 of 4,157,543Top 2%
42
Patents All Time

Issued Patents All Time

Showing 26–42 of 42 patents

Patent #TitleCo-InventorsDate
6248628 Method of fabricating an ONO dielectric by nitridation for MNOS memory cells Arvind Halliyal, Hideki Komori, Kenneth Wo-Wai Au 2001-06-19
6242305 Process for fabricating a bit-line using buried diffusion isolation Hideki Komori, Bharath Rangarajan, Fei Wang 2001-06-05
6218292 Dual layer bottom anti-reflective coating 2001-04-17
6207502 Method of using source/drain nitride for periphery field oxide and bit-line oxide Kenneth Wo-Wai Au, Steven K. Park, Fei Wang, Bharath Rangarajan 2001-03-27
6168993 Process for fabricating a semiconductor device having a graded junction Bharath Rangarajan, George J. Kluth, Fei Wang 2001-01-02
6121663 Local interconnects for improved alignment tolerance and size reduction William G. En, Darin A. Chan, Fei Wang, Minh Van Ngo 2000-09-19
6114235 Multipurpose cap layer dielectric Minh Van Ngo, Christopher F. Lyons, Fei Wang, Raymond T. Lee, William G. En +2 more 2000-09-05
6103611 Methods and arrangements for improved spacer formation within a semiconductor device William G. En, Minh Van Ngo, Chih-Yuh Yang, Scott A. Bell, Olov Karlsson +1 more 2000-08-15
6063665 Method for silicon surface control for shallow junction formation Nicholas H. Tripsas 2000-05-16
6060393 Deposition control of stop layer and dielectric layer for use in the formation of local interconnects Minh Van Ngo, Darin A. Chan 2000-05-09
6040619 Semiconductor device including antireflective etch stop layer Fei Wang, Myron R. Cagan, Subhash Gupta 2000-03-21
6022799 Methods for making a semiconductor device with improved hot carrier lifetime Minh Van Ngo, Darin A. Chan 2000-02-08
5989957 Process for fabricating semiconductor memory device with high data retention including silicon oxynitride etch stop layer formed at high temperature with low hydrogen ion concentration Minh Van Ngo, Sunil Mehta 1999-11-23
5990524 Silicon oxime spacer for preventing over-etching during local interconnect formation William G. En, Minh Van Ngo, Chih-Yuh Yang, Scott A. Bell, Olov Karlsson +1 more 1999-11-23
5963841 Gate pattern formation using a bottom anti-reflective coating Olov Karlsson, Christopher F. Lyons, Minh Van Ngo, Scott A. Bell 1999-10-05
5895269 Methods for preventing deleterious punch-through during local interconnect formation Fei Wang, Minh Van Ngo, Darin A. Chan, William G. En 1999-04-20
5710067 Silicon oxime film Subash Gupta 1998-01-20