| 7026691 |
Minimizing transistor size in integrated circuits |
Craig S. Sander, Rich Klein, Asim A. Selcuk, Nicholas J. Kepler, Christoper A. Spence +2 more |
2006-04-11 |
| 6479350 |
Reduced masking step CMOS transistor formation using removable amorphous silicon sidewall spacers |
Zicheng Gary Ling, Todd P. Lukanc |
2002-11-12 |
| 6287904 |
Two step mask process to eliminate gate end cap shortening |
Zicheng Gary Ling |
2001-09-11 |
| 6287953 |
Minimizing transistor size in integrated circuits |
Craig S. Sander, Rich Klein, Asim A. Selcuk, Nicholas J. Kepler, Christoper A. Spence +2 more |
2001-09-11 |
| 6221706 |
Aluminum disposable spacer to reduce mask count in CMOS transistor formation |
Todd P. Lukanc, Zicheng Gary Ling, Matthew S. Buynoski |
2001-04-24 |
| 6218224 |
Nitride disposable spacer to reduce mask count in CMOS transistor formation |
Todd P. Lukanc, Zicheng Gary Ling |
2001-04-17 |
| 6214655 |
Amorphous silicon disposable spacer to reduce mask count in CMOS transistor formation |
Zicheng Gary Ling |
2001-04-10 |
| 6191034 |
Forming minimal size spaces in integrated circuit conductive lines |
Richard K. Klein, Asim A. Selcuk, Nicholas J. Kepler, Christopher A. Spence, John C. Holst +1 more |
2001-02-20 |
| 6166428 |
Formation of a barrier layer for tungsten damascene interconnects by nitrogen implantation of amorphous silicon or polysilicon |
Sunil Mehta, William G. En, Darin A. Chan |
2000-12-26 |
| 6146954 |
Minimizing transistor size in integrated circuits |
Richard K. Klein, Asim A. Selcuk, Nicholas J. Kepler, Craig S. Sander, Christopher A. Spence +2 more |
2000-11-14 |
| 6114235 |
Multipurpose cap layer dielectric |
David K. Foote, Minh Van Ngo, Christopher F. Lyons, Fei Wang, William G. En +2 more |
2000-09-05 |
| 6103563 |
Nitride disposable spacer to reduce mask count in CMOS transistor formation |
Todd P. Lukanc, Zicheng Gary Ling |
2000-08-15 |
| 6051881 |
Forming local interconnects in integrated circuits |
Richard K. Klein, Asim A. Selcuk, Nicholas J. Kepler, Craig S. Sander, Christopher A. Spence +2 more |
2000-04-18 |
| 6046088 |
Method for self-aligning polysilicon gates with field isolation and the resultant structure |
Richard K. Klein, Asim A. Selcuk, Nicholas J. Kepler, Craig S. Sander, Christopher A. Spence +2 more |
2000-04-04 |
| 5930659 |
Forming minimal size spaces in integrated circuit conductive lines |
Richard K. Klein, Asim A. Selcuk, Nicholas J. Kepler, Christopher A. Spence, John C. Holst +1 more |
1999-07-27 |
| 5879980 |
Method of making static random access memory cell having a trench field plate for increased capacitance |
Asim A. Selcuk |
1999-03-09 |
| 5844836 |
Memory cell having increased capacitance via a local interconnect to gate capacitor and a method for making such a cell |
Nicholas J. Kepler, Asim A. Selcuk, Richard K. Klein, Craig S. Sander, John C. Holst +2 more |
1998-12-01 |
| 5796651 |
Memory device using a reduced word line voltage during read operations and a method of accessing such a memory device |
Stephen C. Horne, Richard K. Klein, Asim A. Selcuk, Nicholas J. Kepler, Christopher A. Spence +1 more |
1998-08-18 |
| 5674781 |
Landing pad technology doubled up as a local interconnect and borderless contact for deep sub-half micrometer IC application |
Richard J. Huang, Robin Cheung, Rajat Rakkhit |
1997-10-07 |
| 5654589 |
Landing pad technology doubled up as local interconnect and borderless contact for deep sub-half micrometer IC application |
Richard J. Huang, Robin Cheung, Rajat Rakkhit |
1997-08-05 |
| 5627110 |
Method for eliminating window mask process in the fabrication of a semiconductor wafer when chemical-mechanical polish planarization is used |
Richard K. Klein |
1997-05-06 |
| 5582881 |
Process for deposition of a Ti/TiN cap layer on aluminum metallization and apparatus |
Paul R. Besser, Khanh Tran |
1996-12-10 |