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Triple layer anti-reflective hard mask |
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2011-02-15 |
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Non-critical complementary masking method for poly-1 definition in flash memory device fabrication |
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2007-12-11 |
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2006-03-07 |
| 6540591 |
Method and apparatus for post-polish thickness and uniformity control |
Alexander J. Pasadyn, Anthony J. Toprac |
2003-04-01 |
| 6454899 |
Apparatus for filling trenches |
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2002-09-24 |
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Infrared inspection for determining residual films on semiconductor devices |
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2002-09-17 |
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2002-09-03 |
| 6379216 |
Rotary chemical-mechanical polishing apparatus employing multiple fluid-bearing platens for semiconductor fabrication |
— |
2002-04-30 |
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Kevin Shipley |
2001-12-18 |
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Method for filling trenches |
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2001-09-04 |
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Method and apparatus for controlling within-wafer uniformity in chemical mechanical polishing |
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2001-08-21 |
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System and method for controlling a multi-arm polishing tool |
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2001-01-09 |
| 6155915 |
System and method for independent air bearing zoning for semiconductor polishing device |
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2000-12-05 |
| 6106661 |
Polishing pad having a wear level indicator and system using the same |
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2000-08-22 |
| 6057068 |
Method for determining the efficiency of a planarization process |
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2000-05-02 |
