Issued Patents All Time
Showing 25 most recent of 77 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7200459 | Method for determining optimal photolithography overlay targets based on process performance and yield in microelectronic fabrication | Christopher A. Bode | 2007-04-03 |
| RE39518 | Run to run control process for controlling critical dimensions | Douglas John Downey, Subhash Gupta | 2007-03-13 |
| 7181354 | Method and apparatus for data stackification for run-to-run control | Christopher A. Bone | 2007-02-20 |
| 7103439 | Method and apparatus for initializing tool controllers based on tool event data | Christopher A. Bode, Alexander J. Pasadyn, Joyce S. Oey Hewett, Anastasia Oshelski Peterson, Thomas J. Sonderman +1 more | 2006-09-05 |
| 6988017 | Adaptive sampling method for improved control in semiconductor manufacturing | Alexander J. Pasadyn, Michael L. Miller | 2006-01-17 |
| 6970757 | Method and apparatus for updating control state variables of a process control model based on rework data | Joyce S. Oey Hewett, Christopher A. Bode, Alexander J. Pasadyn, Anastasia Oshelski Peterson, Thomas J. Sonderman +1 more | 2005-11-29 |
| 6937914 | Method and apparatus for controlling process target values based on manufacturing metrics | Christopher A. Bode, Thomas J. Sonderman, Alexander J. Pasadyn, Joyce S. Oey Hewett, Anastasia Oshelski Peterson +1 more | 2005-08-30 |
| 6901340 | Method and apparatus for distinguishing between sources of process variation | Alexander J. Pasadyn, Joyce S. Oey Hewett, Christopher A. Bode, Anastasia Oshelski Peterson, Thomas J. Sonderman +1 more | 2005-05-31 |
| 6884147 | Method for chemical-mechanical polish control in semiconductor manufacturing | — | 2005-04-26 |
| 6801817 | Method and apparatus for integrating multiple process controllers | Christopher A. Bode, Alexander J. Pasadyn, Joyce S. Oey Hewett, Anastasia Oshelski Peterson, Thomas J. Sonderman +1 more | 2004-10-05 |
| 6802045 | Method and apparatus for incorporating control simulation environment | Thomas J. Sonderman, Anastasia Oshelski Peterson | 2004-10-05 |
| 6789052 | Method of using control models for data compression | — | 2004-09-07 |
| 6785586 | Method and apparatus for adaptively scheduling tool maintenance | Thomas J. Sonderman, Christopher A. Bode, Alexander J. Pasadyn, Joyce S. Oey Hewett, Anastasia Oshelski Peterson +1 more | 2004-08-31 |
| 6784001 | Automated variation of stepper exposure dose based upon across wafer variations in device characteristics, and system for accomplishing same | Joyce S. Oey Hewett | 2004-08-31 |
| 6746958 | Method of controlling the duration of an endpoint polishing process in a multistage polishing process | Joyce S. Oey Hewett, Gerd Marxsen | 2004-06-08 |
| 6741903 | Method for relating photolithography overlay target damage and chemical mechanical planarization (CMP) fault detection to CMP tool indentification | Christopher A. Bode | 2004-05-25 |
| 6725121 | Method and apparatus for using a dynamic control model to compensate for a process interrupt | Alexander J. Pasadyn | 2004-04-20 |
| 6706541 | Method and apparatus for controlling wafer uniformity using spatially resolved sensors | Michael L. Miller | 2004-03-16 |
| 6699727 | Method for prioritizing production lots based on grade estimates and output requirements | Joyce S. Oey Hewett, Christopher A. Bode, Alexander J. Pasadyn, Anastasia Oshelski Peterson, Thomas J. Sonderman +1 more | 2004-03-02 |
| 6675137 | Method of data compression using principal components analysis | Hongyu Yue | 2004-01-06 |
| 6675058 | Method and apparatus for controlling the flow of wafers through a process flow | Alexander J. Pasadyn, Christopher A. Bode, Joyce S. Oey Hewett, Anastasia Oshelski Peterson, Thomas J. Sonderman +1 more | 2004-01-06 |
| 6643557 | Method and apparatus for using scatterometry to perform feedback and feed-forward control | Michael L. Miller | 2003-11-04 |
| 6632692 | Automated method of controlling critical dimensions of features by controlling stepper exposure dose, and system for accomplishing same | Joyce S. Oey Hewett, Alexander J. Pasadyn | 2003-10-14 |
| 6622059 | Automated process monitoring and analysis system for semiconductor processing | Michael L. Miller | 2003-09-16 |
| 6622061 | Method and apparatus for run-to-run controlling of overlay registration | Christopher A. Bode, Richard D. Edwards | 2003-09-16 |