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USPTO Patent Rankings Data through Dec 31, 2025
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Gerd Marxsen — 19 Patents

AMD: 15 patents #801 of 9,280Top 9%
Globalfoundries: 4 patents #817 of 4,424Top 20%
Austin, TX: #1,717 of 18,064 inventorsTop 10%
Texas: #7,372 of 125,132 inventorsTop 6%
Overall (All Time): #229,345 of 4,157,543Top 6%
19 Patents All Time
Gerd Marxsen has been granted 19 US patents while listed as an inventor at AMD. The first was granted in 2001 and the most recent in February 2013. Gerd Marxsen ranks #229,345 of 4,157,543 US inventors in our database (top 5.5%). Patent records list Gerd Marxsen in Austin, TX, US.

Issued Patents All Time

Showing 1–19 of 19 patents

Patent #TitleCo-InventorsDateApprox Value ⓘ
8383500 Semiconductor device formed by a replacement gate approach based on an early work function metal Joachim Metzger, Robert Binder, Markus Lenski 2013-02-26 $1,610,000
8183139 Reduced defectivity in contacts of a semiconductor device comprising replacement gate electrode structures by using an intermediate cap layer Jens Heinrich 2012-05-22 $2,529,000
8182709 CMP system and method using individually controlled temperature zones Jens Heinrich 2012-05-22 $2,529,000
8152595 System and method for optical endpoint detection during CMP by using an across-substrate signal Mike Schlicker 2012-04-10 $5,913,000
8138038 Superior fill conditions in a replacement gate approach by performing a polishing process based on a sacrificial fill material Jens Heinrich, Katja Steffen 2012-03-20 $9,207,000
7985329 Technique for electrochemically depositing an alloy having a chemical order Axel Preusse 2011-07-26 $4,784,000
7905764 Polishing head using zone control Jens Heinrich 2011-03-15 $6,095,000
7268000 Method and system for controlling the chemical mechanical polishing of substrates by calculating an overpolishing time and/or a polishing time of a final polishing step Dirk Wollstein, Jan Raebiger 2007-09-11 $10,117,000
6958247 Method of electroplating copper over a patterned dielectric layer to enhance process uniformity of a subsequent CMP process Axel Preusse, Markus Nopper, Frank Mauersberger 2005-10-25 $11,546,000
6957997 Method and system for controlling the chemical mechanical polishing by using a sensor signal of a pad conditioner Jens Kramer, Uwe Günter 2005-10-25 $11,546,000
6774030 Method and system for improving the manufacturing of metal damascene structures Axel Preusse 2004-08-10 $1,968,000
6761812 Apparatus and method for electrochemical metal deposition Axel Preusse 2004-07-13 $4,054,000
6752697 Apparatus and method for chemical mechanical polishing of a substrate Uwe Stoeckgen 2004-06-22 $4,162,000
6746958 Method of controlling the duration of an endpoint polishing process in a multistage polishing process Joyce S. Oey Hewett, Anthony J. Toprac 2004-06-08 $3,316,000
6720264 Prevention of precipitation defects on copper interconnects during CMP by use of solutions containing organic compounds with silica adsorption and copper corrosion inhibiting properties Kashmir Sahota, Diana M. Schonauer, Johannes Groschopf, Steven C. Avanzino 2004-04-13 $3,617,000
6699107 Polishing head and apparatus with an improved pad conditioner for chemical mechanical polishing Uwe Stoeckgen 2004-03-02 $3,635,000
6620726 Method of forming metal lines having improved uniformity on a substrate Axel Preusse, Markus Nopper 2003-09-16 $3,735,000
6595830 Method of controlling chemical mechanical polishing operations to control erosion of insulating materials Joyce S. Oey Hewett, Anthony J. Toprac 2003-07-22 $3,195,000
6184141 Method for multiple phase polishing of a conductive layer in a semidonductor wafer Steven C. Avanzino, Kashmir Sahota 2001-02-06 $6,888,000